Effects of N element on the micro-structures and properties of (TiAlMoNbW)N high entropy nitride film

Yi Jiang,Lin Yuan,Changchun Zhao,Zhijun Shi,Wenyue Zhao,Fangfang Wang
DOI: https://doi.org/10.1016/j.intermet.2023.108032
IF: 4.075
2023-08-16
Intermetallics
Abstract:High entropy nitride (HEN) films are widely studied in surface modification for mechanical tools and aerospace industry due to their excellent properties. As a decisive element in the HEN structure, N has received much attention from researchers. However, the interaction mechanism of N element with the multiple metal elements around it is still not clear. In this work, the microstructures and properties of (TiAlMoNbW)N x films were studied by a combination of theoretical calculation and experimental characterization. The results show that the content of N element not only changed the microstructure of the films, but also affected the lattice distortion of W and Mo elements significantly. And more importantly, the existence of N vacancy increased or decreased the strength and stability of Ti–N, Mo–N, Nb–N and W–N covalent bonds around it, thus further influencing the hardness, wear resistance and corrosion resistance of the film. This work reveals the effect of N element on the microstructures and properties of (TiAlMoNbW)N x films from the micro and electronic scale, and will provide the basis and ideas for the design and research of HEN films.
materials science, multidisciplinary,chemistry, physical,metallurgy & metallurgical engineering
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