P‐1.11: Relationship Between Effective Mobility and Source/Drain Resistance in Self‐Aligned Top‐Gate A‐igzo Thin Film Transistors

Hao Peng,Shengdong Zhang
DOI: https://doi.org/10.1002/sdtp.13605
2019-01-01
Abstract:We study the effect of source/drain resistance (RSD) on the effective mobility (µeff) of self‐aligned top‐gate (SATG) amorphous indium‐gallium‐zinc oxide (a‐IGZO) thin film transistors (TFTs). The mathematical equation of the relationship between 1/µeff and RSD obtained by a theoretical derivation exhibits that 1/µeff is a quadratic function of RSD, and the relationship is approximately linear when RSD is small enough. This relationship is demonstrated by using a technology computer aided design (TCAD) simulation. With the mathematical equation, a simple calculation can predict the extent of µeff degradation induced by RSD in various TFTs, and the effect of RSD on the µeff when the TFTs are scaled down is discussed.
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