Source-drain Resistance Characteristics of Back-Channel Etched Amorphous InGaZnO Thin Film Transistors with TiO 2 :Nb Protective Layer

Letao Zhang,Xiaoliang Zhou,Baozhu Chang,Longyan Wang,Yuxiang Xiao,Hongyu He,Shengdong Zhang

DOI: https://doi.org/10.1016/j.mssp.2017.04.020

IF: 4.1

2017-01-01

Materials Science in Semiconductor Processing

Abstract:This work investigates the source-drain (S-D) parasitic resistance (RSD) characteristics of the back-channel-etched (BCE) a-IGZO TFTs with ultra-thin Nb doped TiO2 (TNO) protective layer. It is shown that RSD is strongly related to the thickness of the TNO protective layer although the electrical performances of the BCE a-IGZO TFTs with different TNO thickness are similar to each other. The BCE TFT with 3nm TNO shows an unusually large RSD value (300Ωcm). It is suggested that a ~3nm TNO depletion layer should be formed at the TNO/a-IGZO interface in the S-D region in this case. In addition, RSD of the BCE TFTs with 1 and 5nm TNO is 11 and 26Ωcm, respectively. The low RSD of these two devices is caused by much thinner TNO depletion layers in the S-D region. Besides, a moderate RSD of 53Ωcm for the S-D lift-off device can be ascribed to a lower a-IGZO band bending at the Mo/a-IGZO interface than that of the BCE devices at the TNO/a-IGZO interface.