Amorphous InGaZnO Thin-Film Transistors With Sub-10-nm Channel Thickness and Ultrascaled Channel Length

Subhranu Samanta,Kaizhen Han,Chen Sun,Chengkuan Wang,Annie Kumar,Aaron Voon-Yew Thean,Xiao Gong
DOI: https://doi.org/10.1109/ted.2020.3048920
IF: 3.1
2021-03-01
IEEE Transactions on Electron Devices
Abstract:We investigate the effect of channel layer thickness on effective mobility ( $mu _{text {eff}}$ ) in the sub-10-nm regime of amorphous indium–gallium–zinc–oxide thin-film transistors ( $alpha $ -IGZO TFTs). TFT devices with extremely scaled channel thickness ${t} _{{alpha}-{text {IGZO}}}$ of 3.6 nm were realized, exhibiting low subthreshold swing (SS) of 74.4 mV/decade and the highest effective mobility $mu _{text {eff}}$ of 34 cm<sup>2</sup>/ $Vcdot s $ at a carrier density ${N} _{Carrier}$ of $sim 5 times 10^{12}$ cm<sup>−2</sup> for any kind of $alpha $ -IGZO TFTs having sub-10-nm ${t} _{{alpha}-{text {IGZO}}}$ . No significant degradation of $mu _{text {eff}}$ is observed as $alpha $ -IGZO thickness reduced from 6 to 3.6 nm. By scaling down the channel length ${L} _{text {CH}}$ to 38 nm, high extrinsic transconductance ( ${G} _{m, max}$ ) of $125~mu text{s}/mu text{m}$ (at- ${V}_{text {DS}}$ of 1 V) and ON-state current ${I} _{text {ON}}$ of $350~mu text{A}/mu text{m}$ at ${V}_{text {GS}}$ – ${V} _{T}$ of 3 V with ${V}_{text {DS}}$ of 2.5 V are achieved.
engineering, electrical & electronic,physics, applied
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