Abstract:Light reflection from surfaces is ubiquitous in nature. Diverse optoelectronic devices need durable, omnidirectional, and transparent ultra-antireflective surfaces. Here, we engineered antireflective transparent surfaces composed of silica nanocaps through a simple thermal treatment of a silica-coated monolayer colloidal crystal template. The relationship between the structure and the antireflective performance of the silica nanocaps was systematically studied both experimentally and numerically. On the basis of the understanding of the structure-antireflection relationships, ultra-antireflection coatings with a transmittance of ∼98.75 ± 0.15% in the visible wavelength range were prepared by fabricating two differently sized silica nanocaps. More importantly, the antireflection of the coatings formed by two differently sized nanocaps demonstrated poor dependence on the angle of the incident light (i.e., omnidirectionality). The reflection is <2.5% even at an incident angle of 60°. The prepared ultra-antireflective silica nanocap coatings outperform state-of-the-art transparent antireflective coatings regarding the antireflection performance, the wavelength range, and the omnidirectionality. The silica nanoshells were welded together with the underlying fused silica. Therefore, they can sustain common mechanical friction and scratching, demonstrating extraordinary mechanical durability as verified by sand abrasion tests. Further, the silanized silica nanocaps turned out to be hydrophobic with an outstanding self-cleaning performance without prominently influencing the transmittance. The durable and omnidirectional ultra-antireflective transparent silica nanocaps will have promising applications in solar energy conversion and storage, displays, optical lenses, and a wide range of optoelectronic devices.

Experimental Study on Removal of Antireflection Sol-Gel SiO2 Coating of Fused Silica Assisted by Ion Beam Etching

A recycling strategy of ion beam removal and recoating of sol-gel film on fused silica surface

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Removal of Particle Contaminations on Sol-Gel Coated Fused Silica Surface by Laser Cleaning

Effect of ion beam etching on surface/subsurface structural defect evolution in fused silica optics

Sol-gel Preparation of a Silica Antireflective Coating with Enhanced Hydrophobicity and Optical Stability in Vacuum

Evolution of physical and mechanical properties of fused silica after subsurface damage layer removal by RIE treatment

Combination of scanning ion beam etching and dynamic chemical etching for improving laser damage resistance of fused silica optics

Surface quality and microstructure evolution in fused silica under SF 6 /Ar reactive ion beam etching

Durable Broadband and Omnidirectional Ultra-antireflective Surfaces

Research on Laser-Induced Damage Post-Restoration Morphology of Fused Silica and Optimization of Patterned CO2 Laser Repair Strategy

Optical characterization and laser damage of fused silica optics after ion beam sputtering

Study on the Surface Morphology of Micro-Particles and the Oxide Layer on Silicon Carbide Crystal Using Nanosecond Green Laser Cleaning Assisted with Airflow

Achieving Ultralow Surface Roughness and High Material Removal Rate in Fused Silica Via a Novel Acid SiO2 Slurry and Its Chemical-Mechanical Polishing Mechanism

Investigation on femtosecond laser combined with dynamic wet etching machining of SiC/SiC

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

In situ plasma cleaning of large-aperture optical components in ICF

Morphology evolution of fused silica surface during ion beam figuring of high-slope optical components

Experimental Study on Evolution of Chemical Structure Defects and Secondary Contaminative Deposition during HF-Based Etching

Microstructure evolution and performance degradation of sol-gel silica films induced by helium ion irradiation

Effect of Laser Conditioning on Surface Modification and Laser Damage Resistance of SiO2 Antireflection Film