Abstract:Femtosecond (fs) lasers have been proved to be reliable tools for high-precision and high-quality micromachining of ceramic materials. Nevertheless, fs laser processing using a single-mode beam with a Gaussian intensity distribution is difficult to obtain large-area flat and uniform processed surfaces. In this study, we utilize a customized diffractive optical element (DOE) to redistribute the laser pulse energy from Gaussian to square-shaped Flat-Top profile to realize centimeter-scale low-damage micromachining on single-crystal 4H–SiC substrates. We systematically investigated the effects of processing parameters on the changes in surface morphology and composition, and an optimal processing strategy was provided. Mechanisms of the formation of surface nanoparticles and the removal of surface micro-burrs were discussed. We also examined the distribution of subsurface defects caused by fs laser processing by removing a thin surface layer with a certain depth through chemical mechanical polishing (CMP). Our results show that laser-induced periodic surface structures (LIPSSs) covered by fine SiO2 nanoparticles form on the fs laser-processed areas. Under optimal parameters, the redeposition of SiO2 nanoparticles can be minimized, and the surface roughness Sa of processed areas reaches 120 ± 8 nm after the removal of a 10 μm thick surface layer. After the laser processing, micro-burrs on original surfaces are effectively removed, and thus the average profile roughness Rz of 2 mm long surface profiles decreases from 920 ± 120 nm to 286 ± 90 nm. No visible micro-pits can be found after removing ~1 μm thick surface layer from the laser-processed substrates.

Removal of Particle Contaminations on Sol-Gel Coated Fused Silica Surface by Laser Cleaning

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Study on the Surface Morphology of Micro-Particles and the Oxide Layer on Silicon Carbide Crystal Using Nanosecond Green Laser Cleaning Assisted with Airflow

Sol-gel Preparation of a Silica Antireflective Coating with Enhanced Hydrophobicity and Optical Stability in Vacuum

A recycling strategy of ion beam removal and recoating of sol-gel film on fused silica surface

Achieving Ultralow Surface Roughness and High Material Removal Rate in Fused Silica Via a Novel Acid SiO2 Slurry and Its Chemical-Mechanical Polishing Mechanism

Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

Effect of Laser Conditioning on Surface Modification and Laser Damage Resistance of SiO2 Antireflection Film

Elimination of blind zone in nanoparticle removal on silicon wafers using a double-beam laser shockwave cleaning process

In situ plasma cleaning of large-aperture optical components in ICF

Investigation on femtosecond laser combined with dynamic wet etching machining of SiC/SiC

Removal mechanism of SiC/SiC composites by underwater femtosecond laser ablation

Towards Investigating Surface Quality of Single-Crystal Silicon Optics Polished with Different Processes

Effects of fused silica surface roughness on the interfacial adsorption mechanism of contaminant

Femtosecond laser modification of silicon carbide substrates and its influence on CMP process

Combination of scanning ion beam etching and dynamic chemical etching for improving laser damage resistance of fused silica optics

Rapid and Non-Destructive Repair of Fused Silica with Cluster Damage by Magnetorheological Removing Method

Investigation on the underwater femtosecond laser polishing SiC ceramic

Evolution of physical and mechanical properties of fused silica after subsurface damage layer removal by RIE treatment

Centimeter-scale low-damage micromachining on single-crystal 4H–SiC substrates using a femtosecond laser with square-shaped Flat-Top focus spots

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process