Abstract:Light reflection from surfaces is ubiquitous in nature. Diverse optoelectronic devices need durable, omnidirectional, and transparent ultra-antireflective surfaces. Here, we engineered antireflective transparent surfaces composed of silica nanocaps through a simple thermal treatment of a silica-coated monolayer colloidal crystal template. The relationship between the structure and the antireflective performance of the silica nanocaps was systematically studied both experimentally and numerically. On the basis of the understanding of the structure-antireflection relationships, ultra-antireflection coatings with a transmittance of ∼98.75 ± 0.15% in the visible wavelength range were prepared by fabricating two differently sized silica nanocaps. More importantly, the antireflection of the coatings formed by two differently sized nanocaps demonstrated poor dependence on the angle of the incident light (i.e., omnidirectionality). The reflection is <2.5% even at an incident angle of 60°. The prepared ultra-antireflective silica nanocap coatings outperform state-of-the-art transparent antireflective coatings regarding the antireflection performance, the wavelength range, and the omnidirectionality. The silica nanoshells were welded together with the underlying fused silica. Therefore, they can sustain common mechanical friction and scratching, demonstrating extraordinary mechanical durability as verified by sand abrasion tests. Further, the silanized silica nanocaps turned out to be hydrophobic with an outstanding self-cleaning performance without prominently influencing the transmittance. The durable and omnidirectional ultra-antireflective transparent silica nanocaps will have promising applications in solar energy conversion and storage, displays, optical lenses, and a wide range of optoelectronic devices.

A recycling strategy of ion beam removal and recoating of sol-gel film on fused silica surface

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Removal of Antireflection Sol-Gel SiO2 Coating Based on Ar Ion Beam Etching

Removal of Particle Contaminations on Sol-Gel Coated Fused Silica Surface by Laser Cleaning

Sol-gel Preparation of a Silica Antireflective Coating with Enhanced Hydrophobicity and Optical Stability in Vacuum

Effect of ion beam etching on surface/subsurface structural defect evolution in fused silica optics

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Recovery of fused silica surface damage resistance by ion beam etching

Combination of scanning ion beam etching and dynamic chemical etching for improving laser damage resistance of fused silica optics

Anisotropic Ion Beam Etching Of Fused Silica To Mitigate Subsurface Damage

Improve the Laser Damage Resistance of Fused Silica by Wet Surface Cleaning and Optimized HF Etch Process

Durable Broadband and Omnidirectional Ultra-antireflective Surfaces

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Research on the mitigation of redeposition defects on the fused silica surface during wet etching process

High performance hierarchical nanoporous antireflective films by a facile sol–gel process

Research on Laser-Induced Damage Post-Restoration Morphology of Fused Silica and Optimization of Patterned CO2 Laser Repair Strategy

Recycling of silicon scraps by electron beam melting coupled with directional solidification and its mechanism of impurity removal

Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

Achieving Ultralow Surface Roughness and High Material Removal Rate in Fused Silica Via a Novel Acid SiO2 Slurry and Its Chemical-Mechanical Polishing Mechanism

Evolution of physical and mechanical properties of fused silica after subsurface damage layer removal by RIE treatment