Impact Of Strain On The Performance Of Ge-Si Core-Shell Nanowire Field Effect Transistors

Yuhui He,Yuning Zhao,Shimeng Yu,Chun Fan,Gang Du,Jinfeng Kang,Ruqi Han,Xiaoyan Liu
2008-01-01
Abstract:The performances of Ge-Si core-shell nanowire field effect transistors are evaluated based on a semiclassical ballistic transport model and a phonon-limit model. The valence band structures of Ge-Si core-shell nanowires are calculated by using a k.p method including the strain effect. Three new findings are presented: 1) Strain induces the top valence subbands of Ge core moving-up and substantial band warping; 2) at ballistic transport limit, strain-dependence of current is structure dependence. The strain can remarkably enhance current, but the enhancement can be suppressed by electrostatic effect; 3) at phonon scattering limit, strain causes the enhancement of hole effective mobility of the NW FETs, reaching about 260% at low effective electrical field.
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