Strain Impacts on Electron Mobility in Silicon Nanowires

Jieyu Qin,Jingjie Zhang,Gang Du,Xing Zhang,Xiaoyan Liu
DOI: https://doi.org/10.1109/icsict.2012.6467585
2012-01-01
Abstract:In this paper, we report the impact of lattice-mismatch-induced strain and radial-force-induced strain on the conduction band structures, the acoustic-phonon-limited and optical-phonon-limited electron mobility of silicon nanowires is also presented. Our simulation result shows that high-k gate dielectric (HfO2) induces compressive strain into silicon nanowire due to lattice mismatch, but the radial force has the contrary effect. The compressive strain dominates the reshaping of the conduction band. The down-shifting of the band leads to higher electron density in the strained nanowire. However, the electron mobility is degraded due to the much heavier effective masses.
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