Preparation of TiN Films on AZ91C by Cathode Multi Arc Ion and Its Performance

Fan Duojin,Fan Duowang,Wang Chenglong,Liu Hongzhong

DOI: https://doi.org/10.3969/j.issn.1001-4373.2007.06.048

2007-01-01

Abstract:Experimental Procedure Fig. 1 shows the custom-made Cathode Multi Arc Ion equipment, which is made up of three pars:CCS(computer contral system, Fig. 1's left part), Vacuum Chamber (Fig. 1's middle part) and Air Pump parts(Fig. 1's right part).

What problem does this paper attempt to address?

Ti-TiN Films Prepared by Cathodic Multi Arc Ion Plating on Magnesium Alloy AZ91C

WANG Cheng-long,FAN Duo-wang,LIU Hong-zhong,ZHAO Lin,LU Ping,LENG Na

DOI: https://doi.org/10.3969/j.issn.1005-748x.2008.04.004

2008-01-01

Abstract:TiN films grown on Ti as interlayers were prepared on AZ91C magnesium alloy substrate by cathodic multi arc ion plating.The surface morphology,microstructure and hardness of the films were examined using high-resolution scanning electron microscope(SEM),X-ray energy diffraction spectrometers(EDS) and microcharacter hardness tester.The results show that TiN films with good performance can be obtained on the properly pretreated magnesium substrate by the multi arc ion plating technique.The adhesion force between the film and substrate was over 130 mN,and the complex hardness of the films was about 500 HV whereas that of AZ91C magnesium alloy was about 125 HV.The neutral salt spray accelerated testing indicated that corrosion rate of magnesium alloy after treated by this method declined significantly under ASTM-117 standard test condition.The surface of the films was not corroded obviously after salt spray test for 200 h.Vacuum multi arc ion plating technique can be applied to the area of magnesium alloy surface protection.
Study of optical and electrical properties of TiN thin films prepared by cathodic ion sputtering

Shengnan CHEN,Weihao LIN,Jianxun WANG,Chenlu SONG,Gaorong HAN

DOI: https://doi.org/10.3969/j.issn.1007-791X.2017.04.014

2017-01-01

Abstract:Titanium nitride ( TiN) has become a hot topic in recent years due to its unique physical, chemical, optical, electrical and mechanical properties.In the present work, a homogeneous and dense TiN thin film was deposited on 304 stainless steel substrates by using a cathodic ion sputtering method. The structure, optical and electrical properties of the thin film were studied by X-ray diffraction, scanning electron microscopy, transmission electron microscopy, scanning probe microscopy, U-Vis spectrophotometer and infrared spectroscopy.The results show that the main phase of the film is TiN, which exhibits an orientation along the ( 111) plane, with a small amount of O impurities.The surface roughness Rq is about 21.21 nm, while the average thickness is about 0.896μm.The reflectivity in the middle-far infrared band exceeds 80%, and the calculated hemisphere emittance of the film is about 0.19. The ellipsometry results show that the extinction coefficient and the refractive index of TiN is rather similar as Ag, which makes the TiN film to serve as an excellent candidate for low-emission coating materials.
Investigation on the Interface Preparation and Properties of PCVD TiN Film

He Huang,Xiaodong Zhu,Kewei Xu,JiaWen He

DOI: https://doi.org/10.3321/j.issn:1002-185x.1999.06.015

1999-01-01

Rare Metal Materials and Engineering

Abstract:In this study effort is focused on the interface preparation. Ar ion bombardment was employed at the beginning of the coating process when the coated layer was less than one hundred nano-meter thick. Sudden stoping of the in-flow of TiCl4 followed by high energy Ar ion bombardment can help the chamber recover to its designated temperature and build up to its normal plasma intensity. The high energy Ar ions are also good to densify the layer and decrease residual chlorine content. The experimental results show that when the process above is used instead of the more usual film-making process, the bonding strength of film is much higher, and the wear resistance of film is improved. The corrosion resistance of film is even better than that of stainless steel.
TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition

Yi Jia,Rou Gang Tang,Wei Er Lu,You Tong Fang,Yang Xia

DOI: https://doi.org/10.4028/www.scientific.net/msf.817.466

2015-01-01

Materials Science Forum

Abstract:TiN/AlN nanomultilayers were fabricated by plasma enhanced atomic layer deposition (PEALD). The multi-layers were characterized by HRSEM, XRD, EDS and nanoIndenter. The results showed that TiN/AlN nanomultilayers had a good periodic modulation structure, but with quite a lot of O and C contamination which were brought from PEALD process. The O and C contamination impede the crystallization of TiN, leading to a poor hardness of these nanomultilayers. No super-hardness phenomenon was identified based on Koehler theory. Much more attention needs to be paid on decreasing the O and C contamination in PEALD process.
ADHERENT NANO-SUPERHARD TITANIUM NITRIDE FILM AND ITS FORMING MECHANISM IN MULTI-ARC ION-PLATING SYSTEM

XIANG YU,CHENGBIAO WANG,MENG HUA,PUILAM TAM,YANG LIU,DEYANG YU

DOI: https://doi.org/10.1142/S0218625X07010275

2012-01-01

Surface Review and Letters

Abstract:An adherent nano-superhard titanium nitride (TiN) film on the substrate of Cr12Mo4V high speed steel was prefabricated in a vacuum cathode multi-arc ion-plating system. Microhardness, film-to-substrate adhesion, and microstructure of the film were investigated typically using Vickers hardometer, scratch tester, and X-ray diffractometer. Results show that: (i) the achievable film microhardness is in the range of 35-45 GPa; (ii) the critical load (Lc) of the superhard TiN film is approximately 64N; (iii) the nm scale mean main grain sizes of the film are approximately of 12.7 nm for TiN111, 19.7 nm for TiN200, and 9.6 nm for TiN220; and (iv) compared with the standard TiN film with the hardness of 22GPa, the accomplishment of the nano-superhard TiN film may be due to (a) the ion bombardment induced residual stress within the film, and (b) the combined effect of the decrease of crystalline size and preferred orientation in the plane (111).
Microstructure and Surface Properties of Ticn Films Using Cathodic Arc Deposition Enhanced by Additional Electric Field

Kong Ying,Ma Yinghe,Li Yongjian,Hu Jian,Gao Junfeng,Gong Chunzhi,Tian Xiubo

2017-01-01

Rare Metal Materials and Engineering

Abstract:TiCN coatings were deposited on 304 stainless steel by newly developed cathodic arc deposition enhanced by additional electric field. The effects of the additional electrode current on cathode arc discharge, film microstructure, cross-sectional morphology, wear resistance and adhesion between the film and the substrate were investigated. Results show that the plasma density substantially increases after the introduction of additional electrode in the chamber and the substrate current is improved by nearly 100%. Only a properly higher current of additional electrode may effectively decrease the crystal size and make the film structure denser; consequently the critical load of deposited films is enhanced. The sample deposited at additional electrode current of 30 A possesses the highest adhesion force between the film and the substrate (HF1), and the best wear-resistance featured by narrowest wear tracks. The friction coefficient may decrease by 33% compared with that of the sample fabricated without the assistance of additional electrode. In summary cathodic arc deposition enhanced by additional electric field is effective means to fabricate TiCN films.
High Energy Xenon Ion Beam Assisted Deposition of Tin Film and Its Industrial Application

Xi Wang,Genqing Yang,Xianghuai Liu,Zhihong Zheng,Wei Huang,Shichang Zou,P. J. Martin,A. Bendavid,J. G. Han,J. S. Yoon

DOI: https://doi.org/10.1007/bf01139153

IF: 4.5

1996-01-01

Journal of Materials Science

Abstract:TiN films have been synthesized by ion beam assisted deposition employing xenon ions with an energy of 40 keV. The formed TiN films were investigated systematically in respect of surface morphology, composition, structure and mechanical properties. Then, they were applied to surface protection of scoring dies. Atomic force microscopy and interferometric observation showed that the TiN film is relatively smooth. Rutherford backscattering spectroscopy analysis indicated that few xenon atoms are retained in the film. It was found by transmission electron microscopy and X-ray diffraction experiments that the formed TiN is a nanocrystal (< 10 nm) film and exhibits slightly (200) preferred orientation. An ultra low load microhardness indentor system was used to examine the plastic property of the film and a hardness of 2300 kgf mm−2 was calculated from the measured data. Scratch tests showed that the adhesion of TiN film deposited by ion beam assisted deposition at ambient temperature is superior to that of high temperature physical vapour deposited (PVD) TiN film. Both a pin-on-dick tribotest and SRV wear test revealed that the wear resistance of the specimen can be greatly improved by TiN coating. A five times increase of service life of different scoring dies could be obtained by protection of TiN coating.
Room Temperature Deposition of Titanium Carbide Thin Films Using Dense Plasma Focus Device

RS Rawat,G Macharaga,P Lee,S Xu,S Lee

DOI: https://doi.org/10.1016/s0257-8972(00)01094-x

2003-01-01

AIP Conference Proceedings

Abstract:Thin films of titanium carbide (TiC) were deposited on 304-stainless steel substrates using a dense plasma focus device. The conventional hollow copper anode of the 3.3 kJ Mather type plasma focus device was replaced by solid titanium anode for deposition of TiC thin films. The argon–acetylene admixture (in 7:3 ratio) was used as the filling gas at a pressure of 1.5 mbar. Substrates were placed along the anode axis at a distance of 11.5 cm from the top of the anode. Thin films of TiC were deposited using different numbers of focus shots, like 10, 20 and 30, at room temperature substrates. Deposited films were analyzed for their structure, surface morphology, surface profile, elemental composition and distribution using X-ray diffraction (XRD), scanning electron microscopy (SEM), surface profiling and energy dispersive X-ray spectroscopy (EDX). XRD patterns in all three cases are found to have diffraction peaks for (111), (200), (220), (311) and (222) TiC crystalline planes. Scanning electron micrographs show a smooth film surface with increasing clustering of TiC grains with the increase in number of focus deposition shots. EDX spectra confirm the presence of expected constituent elements with the gradual increase in TiKα peak (of the TiC thin film) relative to FeKα peak (of the substrate) with increasing numbers of focus deposition shots due to increasing film thickness. EDX mapping reveals a uniform distribution of TiC over the substrate surface. These results confirm the first ever deposition of TiC thin films using a dense plasma focus device.
A Thick Tin/Ticn Multilayer Film by Dc Magnetron Sputtering

Jianyun Zheng,Junying Hao,Xiaoqiang Liu,Qiuyu Gong,Weimin Liu

DOI: https://doi.org/10.1016/j.surfcoat.2012.08.045

2012-01-01

Abstract:A thick TiN/TiCN multilayer film was prepared on steel and silicon (Si) substrates using a DC magnetron sputtering technique under a high deposition rate. Its thickness reached about 23.5μm and it was composed of 30 bilayer numbers. X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), cross-sectional high resolution transmission electron microscopy (HRTEM) and field emitted scanning electron microscopy (FESEM) were employed to characterize the composition and structure of the film on the Si substrates. It was found that the inner TiCN layers consisted of a mixture nanocrystalline TiCN phase and amorphous carbon, and the TiN layers showed nano-columnar structure. The adhesion force and the hardness of the film deposited on steel substrates were 29.0N and 21.4GPa, respectively. It was revealed that the thick film still maintained the excellent mechanical properties. The film sliding against steel ball had good wear resistance and very long service life (>11h) in ambient air under high rotate speed and large load.
Growth feature of ionic nitrogen doped CN x bilayer films with Ti and TiN interlayer by pulse cathode arc discharge

bing zhou,zhubo liu,d g piliptsou,a v rogachev,shengwang yu,yanxia wu,bin tang,a s rudenkov

DOI: https://doi.org/10.1016/j.apsusc.2015.11.106

IF: 6.7

2016-01-01

Applied Surface Science

Abstract:•Ti/ and TiN/CNx (N+) bilayers are prepared at various frequencies by pulse cathode arc.•Ti interlayer facilitates the introduction of N atoms into the CNx (N+) films.•The most N-sp2C bonds (mainly graphite-like N) present in the TiN/CNx (N+, 3Hz) film.•Ti/CNx (N+, 3Hz) bilayer possesses small size and disordering of Csp2 clusters.•The higher hardness and the lower stress presents in the TiN/CNx (N+, 10Hz) bilayer.
Improved control of TiN coating properties using cathodic arc evaporation with a pulsed bias

W. Olbrich,J. Fessmann,G. Kampschulte,J. Ebberink

DOI: https://doi.org/10.1016/0257-8972(91)90065-5

IF: 4.865

1991-12-01

Surface and Coatings Technology

Abstract:A combined d.c.-pulse bias voltage was used in combination with a cathodic arc evaporation process for the deposition of TiN on planar plates and drilling tools at substrate temperatures T between 330 and 500 °C. This new pulse technique appeared to be a powerful tool to achieve independent control of the substrate temperature, coating adhesion and uniformity of deposition. As a result, high coating adhesion can be obtained at low substrate temperatures. The adhesion uniformity across large-area samples is considerably improved. Unpolished rough substrate parts can be coated without cauliflower-like growth defects. Because of intensive ion bombardment in the pulse period, smoother TiN coatings with a reduced droplet size were obtained.

physics, applied,materials science, coatings & films
Fabrication and Performance of TiN/TiAlN Nanometer Modulated Coatings

Chang-Lin Liang,Guo-An Cheng,Rui-Ting Zheng,Hua-Ping Liu

DOI: https://doi.org/10.1016/j.tsf.2011.04.159

IF: 2.1

2011-01-01

Thin Solid Films

Abstract:TiN/TiAlN multilayered coatings with bilayer periods (λBD) ranging from 6 to 30nm were prepared on TC4 alloy and Si (100) wafer substrates by magnetic filtered pulsed vacuum cathodic arc plasma technique. The analyses with scanning electron microscope (SEM), X-ray diffraction (XRD), X-ray energy dispersive spectroscope (EDS) and X-ray photoelectron spectroscope (XPS) with Ar+sputtering indicated that the as-deposited coatings had nanometer modulated structure, TiN and TiAlN with (111) preferred orientation were the main compounds and the average atoms ratio of N:(Ti+Al) was about 1.24–1.29. Scratch test showed that the coatings were fairly adherent to TC4 substrates, and the maximal critical load was about 57N. The highest nano-hardness and modulus about 28GPa and 283GPa, respectively, were obtained for the multilayer with λBD=12nm, examined with nano-indentation method. The electrochemical corrosion test showed that the coatings improved the TC4 alloy's property of anti-corrosion effectively, especially with λBD=20nm.
Ion Bombardment On Mechanical Properties Of Ibad Tin Films .2. Effect Of Ion Bombardment Procedures On The Bonding Strength

Xd Zhu,Kw Xu,Jw He,Yq Fu,Aw Batchelor

1997-01-01

Abstract:Thin TiN films were deposited on steel and silicon substrates by ion-beam-assisted-deposition (IBAD) technique. The deposition process involves sputtering the titanium target while using N+ ion beam to bombard the film. In this paper, the deposition parameters were Changed by varying the ion bombardment procedures. Four kinds of procedures were investigated: (I) Pre-implantation for one hour before IBAD process; (2) Direct IBAD process; (3) Pre-sputtering deposition for half an hour before IBAD process; (4) Sputtering deposition without ion bombardment. The bonding strengths of TiN films with substrate were evaluated by a new method modified from the rolling contact fatigue test.The experiment results showed that the bonding strengths were quite different for these four bombardment procedures. The bonding strength of specimens with pure sputtering deposition is the poorest. The bonding strength of specimens with preimplantation far 1 hour is much better. The process of pre-sputtering for half an hour obtained the best bonding strength. The main factors which influenced the bonding strength were discussed in this paper.
In-situ formation of ultra-hard titanium-based composite coatings on carbon steel through electro-spark deposition in different gas media

Farzad Habibi,Ahad Samadi

DOI: https://doi.org/10.1016/j.surfcoat.2024.130472

IF: 4.865

2024-02-04

Surface and Coatings Technology

Abstract:In the current study, ultra-hard TiC, TiN, and Ti(C,N) layers were in-situ formed on carbon steel substrate using pure titanium electrode via electro-spark deposition (ESD) in argon, nitrogen, argon/nitrogen, and air atmospheres. The synthesized coatings were characterized using various techniques, including FE-SEM/EDS, X-ray diffractometry, Raman spectroscopy, microhardness and nanoindentation tests, and surface roughness measurement. Also, a thermodynamic simulation was executed to estimate the phase-stability. Fe 5 C 2 , TiN, Fe 3 N, and Ti 2 O 3 were determined as the major phases formed under the argon, nitrogen, Ar/N 2 , and air atmospheres, respectively. The formation of martensite at the interface of the coating and substrate in all atmospheres indicates the capability of the ESD process for surface hardening. The observed discrepancies between the empirically formed phases and the thermodynamics prediction can be related to the non-equilibrium conditions of the ESD process. It was revealed that gaseous media such as argon and nitrogen serve as a protective/active environment in the titanium/steel system. It is proposed that the electro-sparking of titanium under the active nitrogen medium follows an avalanche plasma regime. Under the argon flow, FeTi intermetallic layer is formed. Whilst, electro-sparking in ambient air leads to the formation of various Fe-Ti-O compounds, as well as different TiO n oxides. On the other hand, the utilization of nitrogen gas during the ESD increases the surface roughness and the thickness of the coating, rather than the deposition under the argon flow, due to the extra heat of reactions . The dynamic reactions occur between pure titanium, nitrogen, carbon, and oxygen, leading to the initial formation of Ti(C,N) at the top surface, followed by the production of titanium oxides in the middle layer. The coexistence of the super-hard Ti(C,N) with a hardness of 3130 HV at the top surface and titanium nitrides beneath it in a gradient mode effectively impedes the crack propagation.

physics, applied,materials science, coatings & films
Characterization of Ti-Al-N Films Deposited by Cathodic Vacuum Arc with Different N2 Partial Pressure

G. P. Zhang,X. Q. Wang,G. H. Lv,H. Chen,H. Pang,L. Zhou,J. Huang,W. Chen,S. Z. Yang

DOI: https://doi.org/10.4028/www.scientific.net/amr.287-290.2429

2011-01-01

Advanced Materials Research

Abstract:A series of Ti-Al-N films were deposited on silicon wafer and steel substrates by cathodic vacuum arc technique in N2/Ar gas mixtures, using a compound Ti(50):Al(50) target. The chemical composition, crystalline microstructure, film deposition rate and surface morphology of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscope (SEM) coupled with an energy dispersive X-ray analysis system (EDX), respectively. The hardness and Young’s modulus, wear performance and corrosion behavior of the Ti-Al-N (multi-phase) films at different N2 partial pressure were analyzed and explained on the basis of microstructure, mechanical properties and wear mechanisms.
Enhancing the Hardness of Arc-Ion-Plated Nanocrystallite Tin Films

X. Yu,M. Hua,C. B. Wang,Y. Liu,D. Y. Yu,S. L. Ma

DOI: https://doi.org/10.1088/0957-4484/18/35/355710

IF: 3.5

2007-01-01

Nanotechnology

Abstract:Enhancing the hardness of nanocrystallite TiN films synthesized on M2 steel substrate in a vacuum cathode multi-arc ion-plating system was investigated. The synthesized film gives: (i) mean grain sizes of about 12.7 nm for TiN111, 19.7 nm for TiN200 and 9.6 nm for TiN220; and (ii) achievable microhardness up to 45 GPa that is more than twice the 22 GPa for standard TiN film. Such hardness enhancement is anticipated as being mainly due to: (i) the formation of nanoscale crystalline grains; (ii) the preferential orientation and growth of grains in the close-packed plane ( 111); and (iii) induced residual stress within the film by ion bombardment.
XPS of Ti+TiN+(N,C) Multilayer Films Deposited by Filtered Cathodic Arc Deposition with Controlled Feed Gas Flow Rate

LH Li,LF Xia,XX Ma

DOI: https://doi.org/10.1016/s0257-8972(99)00426-0

1999-01-01

Abstract:Ti+TiN+Ti(N,C) films are deposited in a filtered vacuum arc deposition system by controlling the gas inlet order and gas flow rate, with a steady increase of C2H2 and a steady decrease of N2 flow rate. X-ray photoelectron spectroscopy (XPS) has been used to analysis the element depth profile. The C1s, N1s and Ti2p spectra are discussed.
Formation by reactive magnetron sputtering of TiN coating on Ti-implanted magnesium alloy

Xiaoqin Zeng,Guosong Wu,Shoushan Yao

DOI: https://doi.org/10.1016/j.matlet.2005.12.137

IF: 3

2006-01-01

Materials Letters

Abstract:Reactive magnetron sputtering method was used to deposit TiN coating on Ti-implanted magnesium alloy. FESEM, GIXRD and AES were used to investigate this surface system's micro-morphology, crystalline structure and chemical composition, respectively. It showed that TiN coating took on a compact surface morphology and existed as a columnar crystalline structure. The results of the electrochemical test and immersion test showed that the corrosion resistance of AZ31 was greatly improved in 3.5 wt.% NaCl solution by this kind of surface treatment technique. It was mainly due to the combined effect of the dense TiN coating, the Ti-implanted layer and the good adhesion between coating and substrate.
Preparation of the Ti(C,N) Film by Ion Plating and Its Oxidation Resistance

沈星,万建国

DOI: https://doi.org/10.3969/j.issn.0254-6051.2003.12.005

2003-01-01

Abstract:The multi-component Ti(C,N) film was deposited on austenite stainless steel 1Cr18Ni9Ti.By measuring the film's basic properties,the optimum flow ratio of reactive gases (C_2H_2 and N_2) was confirmed to be 0.1,with the flow C_2H_2 and N_2 is 5mL/min and 50mL/min respectively.The oxidation resistance of the film at the temperature range of 750℃～950℃ was studied by SEM and XRD analysis,the results show that the Ti(C,N) film has excellent oxidation resistance and can efficiently protect the substrate,especially at high temperature.
Fabrication of Titanium Carbide Film on Bearing Steel by Plasma Immersion Ion Implantation and Deposition

BY Tang,HX Liu,LP Wang,XF Wang,KY Gan,YH Yu,YH Wang,T Sun,SY Wang

DOI: https://doi.org/10.1016/j.surfcoat.2004.03.036

2004-01-01

Abstract:Titanium carbide films have been synthesized by plasma immersion ion implantation and deposition (PIIID) on 9Cr18 bearing steel. During the experiments, acetylene (C2H2) and titanium plasmas were generated simultaneously. Acetylene plasma was produced by a radio-frequency plasma source, and titanium plasma was generated by cathodic arc plasma source. Influences of gas pressure and pulse width of the bias voltage on properties of the thin film were investigated. The as-deposited films were characterized by X-ray diffraction (XRD), micro-hardness tester, pin-on-disc tribological facility and electrochemistry corrosion equipment. XRD pattern proves that TiC phase is formed in the film. Compared with uncoated substrates, micro-hardness results reveal that the maximum micro-hardness is increased by 70.8%. In addition, the friction coefficient decreases to about 0.1, and the corrosion resistance of coated substrate surfaces is improved significantly.

Preparation of TiN Films on AZ91C by Cathode Multi Arc Ion and Its Performance

Ti-TiN Films Prepared by Cathodic Multi Arc Ion Plating on Magnesium Alloy AZ91C

Study of optical and electrical properties of TiN thin films prepared by cathodic ion sputtering

Investigation on the Interface Preparation and Properties of PCVD TiN Film

TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition

ADHERENT NANO-SUPERHARD TITANIUM NITRIDE FILM AND ITS FORMING MECHANISM IN MULTI-ARC ION-PLATING SYSTEM

Microstructure and Surface Properties of Ticn Films Using Cathodic Arc Deposition Enhanced by Additional Electric Field

High Energy Xenon Ion Beam Assisted Deposition of Tin Film and Its Industrial Application

Room Temperature Deposition of Titanium Carbide Thin Films Using Dense Plasma Focus Device

A Thick Tin/Ticn Multilayer Film by Dc Magnetron Sputtering

Growth feature of ionic nitrogen doped CN x bilayer films with Ti and TiN interlayer by pulse cathode arc discharge

Improved control of TiN coating properties using cathodic arc evaporation with a pulsed bias

Fabrication and Performance of TiN/TiAlN Nanometer Modulated Coatings

Ion Bombardment On Mechanical Properties Of Ibad Tin Films .2. Effect Of Ion Bombardment Procedures On The Bonding Strength

In-situ formation of ultra-hard titanium-based composite coatings on carbon steel through electro-spark deposition in different gas media

Characterization of Ti-Al-N Films Deposited by Cathodic Vacuum Arc with Different N2 Partial Pressure

Enhancing the Hardness of Arc-Ion-Plated Nanocrystallite Tin Films

XPS of Ti+TiN+(N,C) Multilayer Films Deposited by Filtered Cathodic Arc Deposition with Controlled Feed Gas Flow Rate

Formation by reactive magnetron sputtering of TiN coating on Ti-implanted magnesium alloy

Preparation of the Ti(C,N) Film by Ion Plating and Its Oxidation Resistance

Fabrication of Titanium Carbide Film on Bearing Steel by Plasma Immersion Ion Implantation and Deposition