XPS of Ti+TiN+(N,C) Multilayer Films Deposited by Filtered Cathodic Arc Deposition with Controlled Feed Gas Flow Rate

LH Li,LF Xia,XX Ma
DOI: https://doi.org/10.1016/s0257-8972(99)00426-0
1999-01-01
Abstract:Ti+TiN+Ti(N,C) films are deposited in a filtered vacuum arc deposition system by controlling the gas inlet order and gas flow rate, with a steady increase of C2H2 and a steady decrease of N2 flow rate. X-ray photoelectron spectroscopy (XPS) has been used to analysis the element depth profile. The C1s, N1s and Ti2p spectra are discussed.
What problem does this paper attempt to address?