Investigation of the characteristics of TiN-coating film deposited by arc ion plating method and the feasibility of measuring residual stress according to heat treatment
Chang-Suk Han,Sung-Soon Park,Min-Gyu Chun
DOI: https://doi.org/10.1007/s40042-024-01054-2
2024-03-21
Journal of the Korean Physical Society
Abstract:TiN-coating films have excellent hardness, heat resistance, abrasion resistance, and corrosion resistance, and are used in a variety of applications, from industrial applications such as mechanical parts and cutting tools to decorative items. The usefulness of TiN has also been confirmed in the semiconductor field, where it is used in walls to prevent diffusion in semiconductor materials. The objectives of this study were twofold. The first was to investigate the feasibility of stress measurement using X-rays on TiN coatings deposited by arc ion plating (AIP), and to investigate the dependence of the deposition temperature and film thickness on the residual stress characteristics of the coating and substrate interface layer. Secondly, the surface morphology of TiN coatings was observed and the hardness, crystal orientation characteristics, and residual stress values of TiN coatings were investigated with the aim of examining the characteristics of the heat treatment of the coatings. In addition, from the viewpoint that it is important to investigate the state of the interfacial layer between the coating film and the substrate to evaluate the performance of the coating material, the residual stress, hardness, and crystalline state of the substrate side of the interfacial layer in response to heat treatment were investigated, and in particular, the effect of heat treatment on the composition ratio was investigated on the surface of the TiN-coating film, the inside of the coating film, and the interfacial layer between the coating film and the substrate.
physics, multidisciplinary