Mechanical properties of TiN deposited in synchronous bias mode through high-power impulse magnetron sputtering
Jian-Fu Tang,Shi-Yu Huang,Ja-Hon Lin,Fu-Chi Yang,Chi-Lung Chang
DOI: https://doi.org/10.1016/j.surfcoat.2022.128201
IF: 4.865
2022-03-01
Surface and Coatings Technology
Abstract:Single or doubly ionized metal and gas ions (i.e., N+, N2+, Ti+, Ti2+, Ar+) in the HiPIMS plasma discharge of Ti contribute multiple functions, and the dissociated ions that arrive on a substrate during deposition differ in terms of distribution time and incident flux. Through the application of bias voltage, the incident flux and impact energy of various species of gas and metal ions can be independently controlled to obtain a dense structure, low residual stress, and high adhesion of coating at low deposition temperatures. In this work, we aimed to control the behavior of metal ions through a synchronous pulse DC (SP-DC) bias with variable trigger delay (TD; 0, 50, 100, and 150 μs), and its results were compared with that of a DC bias mode. The SP-DC bias can precisely control the flux of Ti+ and N+ ion, allowing for the deposition rate of TiN coating to be increased. Furthermore, when TD time was increased from 0 to 100 μs, the preferred orientation was (111), and when a DC bias with a TD of 150 μs was applied, the preferred orientation was (200). When the bias system was changed from a DC to synchronous one, residual stress decreased from −6.7 to −4.0 GPa because of a less intensive Ar+ ion bombardment, which improved adhesion from 62.7 to 83.7 N. The most favorable results for hardness (31.1 GPa), elastic modulus (561 GPa), adhesion strength (83.7 N), and lowest wear rate (2 × 10−5 mm3 N−1 m−1) were obtained in a synchronous mode.
physics, applied,materials science, coatings & films