Fabrication and Performance of TiN/TiAlN Nanometer Modulated Coatings

Chang-Lin Liang,Guo-An Cheng,Rui-Ting Zheng,Hua-Ping Liu
DOI: https://doi.org/10.1016/j.tsf.2011.04.159
IF: 2.1
2011-01-01
Thin Solid Films
Abstract:TiN/TiAlN multilayered coatings with bilayer periods (λBD) ranging from 6 to 30nm were prepared on TC4 alloy and Si (100) wafer substrates by magnetic filtered pulsed vacuum cathodic arc plasma technique. The analyses with scanning electron microscope (SEM), X-ray diffraction (XRD), X-ray energy dispersive spectroscope (EDS) and X-ray photoelectron spectroscope (XPS) with Ar+sputtering indicated that the as-deposited coatings had nanometer modulated structure, TiN and TiAlN with (111) preferred orientation were the main compounds and the average atoms ratio of N:(Ti+Al) was about 1.24–1.29. Scratch test showed that the coatings were fairly adherent to TC4 substrates, and the maximal critical load was about 57N. The highest nano-hardness and modulus about 28GPa and 283GPa, respectively, were obtained for the multilayer with λBD=12nm, examined with nano-indentation method. The electrochemical corrosion test showed that the coatings improved the TC4 alloy's property of anti-corrosion effectively, especially with λBD=20nm.
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