Study on PZFNT Ferroelectric Thin Films by RF Magnetron Sputtering

PENG Jia-gen,ZHONG Chao-wei,ZHANG Shu-ren,ZHANG Wan-li
DOI: https://doi.org/10.3969/j.issn.1004-2474.2005.04.022
2005-01-01
Abstract:PZFNT thin films were fabricated on 12.7 cm PZT/Pt/Ti/SiO_2/Si substrates by a RF magnetron sputtering method and rapid thermal annealing process. By investigating the thin films at various annealing temperatures, the results show that the annealing temperature is decreased remarkably, and the dielectric and ferroelectric properties are improved by using PZT buffer layer. In the optimum process, the thin films have the dielectric constant of 1 328 and dielectric loss of 3.1% at 1 kHz. The remanent polarization and coercive field of the thin films are 29.8 μC/cm~2 and 46 kV/cm, respectively. This films have the significant potential for FeRAM and pyroelectric infrared detectors.
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