Photoelectric Properties Of Pbse/Baf2/Caf2 Films On Si(111)

Js Jin,Hz Wu,Y Chang,X Shou,Xm Fang,Pj Mccann
DOI: https://doi.org/10.3321/j.issn:1001-9014.2001.02.018
2001-01-01
JOURNAL OF INFRARED AND MILLIMETER WAVES
Abstract:PbSe films were grown on Si(111) by incorporation of BaF2/CaF2 buffers using molecular beam epitaxy. The measurements of both scanning electronic microscopy and high-resolution X-ray diffraction showed high crystalline quality of the PbSe films. The surface of PbSe was mirror-like and no cracks were observed. The full width at half-maximum of PbSe diffraction peak was only 153 arcsec. The epitaxial PbSe films were used to fabricate photodiodes. For the first time, metallic aluminum was used to form Al-PbSe Schottky diodes, which demonstrated better and more stable current-voltage characteristics than that obtained from Pb-PbSe Schottky diodes.
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