Molecular Beam Epitaxy and Characterizations of PbTe Grown on GaAs(211) Substrates Using CdTe/ZnTe Buffers

Tianyu Shu,Pengqi Lu,Bingpo Zhang,Miao Wang,Lu Chen,Xiangliang Fu,Gangyi Xu,Huizhen Wu
DOI: https://doi.org/10.1016/j.jcrysgro.2015.03.031
IF: 1.8
2015-01-01
Journal of Crystal Growth
Abstract:Narrow-gap semiconductor PbTe has exhibited versatility in both mid-infrared optoelelctronics and thermoelectrics. However, the absence of commercially obtainable PbTe crystal substrates limits its wide applications. In this paper, heteroepitaxy of high-quality PbTe crystal on GaAs(211) using CdTe/ZnTe buffers by molecular beam epitaxy is presented for the first time. Optimal growth parameters have been obtained by both in-situ and ex-situ characterizations. In-situ reflection high-energy electron diffraction observed a transition of growth mode from 2D to 3D, which is in agreement with the results of atomic force microscope and scanning electron microscope characterizations. High resolution X-ray diffraction revealed that the growth of PbTe crystal is along [531] direction which is different from the [211] substrate orientation. Multiple phonon modes related to PbTe were observed by Raman scattering while mid-infrared light emission from epitaxial PbTe is observed at a peak of 3.5μm by photoluminescence. Different from PbTe grown on BaF2(111), n-type conductivity with electron densities of ~5×1017cm−3 and mobilities of 675cm2/Vs at room temperature and 4300cm2/Vs at 2K is observed. The high quality PbTe grown on GaAs(211) substrates using CdTe/ZnTe buffers renders promising applications in both optoelectronics and thermoelectrics.
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