Study of Surface Oxidation of PbTe Films

Jianxiao Si,Qinglei Wang,Haifei Wu,hanjie Zhang,Huizhen Wu,Tianning Xu,Minglong Xia
DOI: https://doi.org/10.13922/j.cnki.cjovst.2008.03.015
2008-01-01
Abstract:PbTe films were grown by molecular beam epitaxy (MBE) on BaF2(111) substrates. Surface microstructures and surface oxidation were characterized with high resolution X-ray diffraction (HRXRD), atomic force microscopy (AFM), low energy electron spectroscopy (LEED) and X-ray photoelectron spectroscopy (XPS). Helical steps were clearly observed on the fairly smooth, compact PbTe surfaces. After exposure in air for three months, thin layers of PbO and TeO2 were found to exist on top of the films. We found that annealing at a temperature of 475°C in ultra high vacuum completely removes the oxidized layers from the PbTe film surfaces. Possible mechanisms were also tentatively discussed.
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