Observation of Thermal-Misfit Strain Relaxation in A Pbte Semiconductor Grown on Cd0.96zn0.04te(111)

J. X. Si,H. Z. Wu,T. N. Xu,M. L. Xia,Q. L. Wang,W. Z. Fang,N. Dai
DOI: https://doi.org/10.1088/0268-1242/23/12/125021
IF: 2.048
2008-01-01
Semiconductor Science and Technology
Abstract:The thermal-misfit strain relaxation in epitaxial PbTe grown on Cd0.96Zn0.04Te(111) substrates has been studied by the combined characterization of atomic force microscopy and high-resolution transmission electron microscopy. It is shown that the strain relaxes by the movement of dislocations in the < 110 >-{100} primary glide system and leaves straight slip steps on the surface. The thermal-misfit strain relaxation is greatly affected by the growth temperature and post-growth cooling rate. Post-growth treatment with a slower cooling rate improves the crystalline quality of PbTe grown on Cd0.96Zn0.04Te(111). Because of the easy dislocation glide down to the interface in the < 110 >-{100} primary glide system, PbTe/Cd0.96Zn0.04Te(111) heterostructures exhibit good crystal and optical qualities, which indicate that PbTe/CdZnTe heterostructures may become a promising candidate for the fabrication of PbTe-based mid-infrared optoelectronic devices.
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