Molecular Beam Epitaxy of Periodic BaF2 /pbeuse Layers on Si(111)

XM Fang,HZ Wu,Z Shi,PJ McCann,N Dai
DOI: https://doi.org/10.1116/1.590744
1999-01-01
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
Abstract:Bragg reflector structures consisting of BaF2/PbEuSe stacks have been epitaxially grown on CaF2/Si (111) substrates. The reflectors are centered at a wavelength of 4.0 μm with a bandwidth of about 3.0 μm. Reflectivity as high as 95% at the center wavelength has been achieved in three-stack reflectors. Cracks were visible under an optical Normarski microscope in two-stack reflectors. The formation of cracks is probably due to the accumulation of the residual thermal strain in thick layers or the hindrance of dislocation glide at the BaF2/PbEuSe interfaces.
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