Photoelectric properties of PbSe/BaF2/CaF2 films on Si (lll)

ShengJin Jin,Huizhen Wu,Yong Chang,Xiang Shou,Xiaoming Fang,Patrick J. McCann
2001-01-01
Abstract:PbSe films were grown on Si (lll) by incorporation BaF2/CaF2 buffers using molecular beam epitaxy. The measurements of scanning electronic microscopy and high-resolution X-ray diffraction showed high crystalline quality of the PbSe films. The surface of PbSe was mirror-like and no cracks were observed. The full width at half-maximum of PbSe diffraction peak was only 153 arcsec. The epitaxial PbSe films were used to fabricate photodiodes. For the first time, metallic aluminum was used to form Al-PbSe Schottky diodes, which demonstrated better and more stable current-voltage characteristics than that obtained from Pb-PbSe Schottky diodes.
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