Memory Behavior of an Al2O3 Gate Dielectric Non-Volatile Field-Effect Transistor

Yue Peng,Wenwu Xiao,Genquan Han,Yan Liu,Fenning Liu,Chen Liu,Yichun Zhou,Nan Yang,Ni Zhong,Chungang Duan,Yue Hao
DOI: https://doi.org/10.1109/led.2020.3010363
IF: 4.8157
2020-01-01
IEEE Electron Device Letters
Abstract:Non-volatile field-effect transistor (FET) with amorphous Al 2 O 3 dielectric is demonstrated on Si substrate, which is enabled by the voltage modulation of the oxygen vacancy and negative charge dipoles in gate insulator. Ferroelectric-like behavior in TaN/Al 2 O 3 /Si 0.70 Ge 0.30 stacks with different thicknesses of Al 2 O 3 is proved by polarization-voltage tests, positive-up and negative-down tests, piezoresponse force microscopy, and electrical measurements. The Al 2 O 3 capacitors attain over 10 8 cycles' endurance of polarization versus voltage measurement. A 6.5 nm-thick Al 2 O 3 non-volatile FET achieves a memory window above 0.6 V under ±2 V at 100 ns program/erase (P/E) condition, over 10 4 cycles P/E endurance, and >10 5 s data retention at room temperature.
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