High-performance non-volatile field-effect transistor memories using an amorphous oxide semiconductor and ferroelectric polymer

Yu Wang,Takio Kizu,Lei Song,Yujia Zhang,Sai Jiang,Jun Qian,Qijing Wang,Yi Shi,Youdou Zheng,Toshihide Nabatame,Kazuhito Tsukagoshi,Yun Li
DOI: https://doi.org/10.1039/c6tc01768a
IF: 6.4
2016-01-01
Journal of Materials Chemistry C
Abstract:Ferroelectric field-effect transistors (Fe-FETs) are of great interest for a variety of non-volatile memory device applications. High-performance top-gate Fe-FET memories using ferroelectric polymers of poly( vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)) and the inorganic oxide of InSiO were fabricated. The extracted electron mobility was as high as 84.1 cm(2) V-1 s(-1) in a low-frequency state. The interfacial charge transfer between the P(VDF-TrFE) and InSiO during annealing of the P(VDF-TrFE) layer benefits improvement in the device performance. The results show the potential of our Fe-FET memories for next-generation electronics.
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