High-Mobility, Low-Voltage Programmable/Erasable Ferroelectric Polymer Transistor Nonvolatile Memory Based on a P(VDF-TrFE)/PMMA Bilayer Gate Insulator

Weihao Qi,Shizhang Li,Meili Xu,Wei Wang
DOI: https://doi.org/10.1109/TED.2021.3077199
IF: 3.1
2021-07-01
IEEE Transactions on Electron Devices
Abstract:Low mobility and high operating voltages are bottlenecks in the practical application of ferroelectric organic field-effect transistor (Fe-OFET) nonvolatile memory (NVM). In this article, we demonstrate a high-mobility polymer semiconductor-based Fe-OFET NVM that can well operate at low programming/erasing voltages (<inline-formula> <tex-math notation="LaTeX">${V}_{{\mathrm {P}}}/{V}_{{\mathrm {E}}}$ </tex-math></inline-formula>). The issue that hinders the reduction of the <inline-formula> <tex-math notation="LaTeX">${V}_{{\mathrm {P}}}/{V}_{{\mathrm {E}}}$ </tex-math></inline-formula> in Fe-OFET NVMs is discussed. We develop a route to resolve the issue by building a thin bilayer gate insulator consisted of an ultrathin poly(methyl methacrylate) (PMMA) and a thin poly(vinylidenefluoride-trifluoroethylene) films. The processing compatibility, that is, the tri-layered core architecture consisting of polymer semiconductor and insulator films is prepared by a full-solution technology, is confirmed. The mechanism of the performance improvements by using the ultrathin PMMA in the Fe-OFET NVMs is investigated. As a result, the Fe-OFET NVM exhibits excellent performances at low <inline-formula> <tex-math notation="LaTeX">${V}_{{\mathrm {P}}}/{V}_{{\mathrm {E}}}$ </tex-math></inline-formula> of ±15 V, with a high mobility up to 1.75 cm<sup>2</sup>/Vs, reliable memory endurance over 400 cycles, and stable memory retention over 65000 s.
Engineering,Physics,Materials Science
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