Abstract:Abstract The material yttrium aluminum oxide (Y 3 Al 5 O 12 ) is one of the materials commonly used in laser devices. For application in optical devices, it is necessary to produce ultra-precise surface quality, however, Y 3 Al 5 O 12 material belongs to the group of difficult-to-machine materials with high brittleness and hardness. Therefore, it is very difficult to ensure that the main criterion when finishing this material to produce a quality surface in the nanometer form with the ability to remove the material is very difficult. To solve this problem, this work provided a new chemical - mechanical polishing mixture. The proposed polishing mixture of ZrO 2 , Na 2 SiO 3 –5H 2 O, and MgO abrasives has a weight ratio of 8%, 5% and 1% respectively, with the remainder being deionized water. The surface result after polishing is obtained with a material removed rate of 38 (nm/min) along with an ultra-smooth surface produced with Ra = 0.41 nm. With the help of X-ray photoelectron spectroscopy (XPS) method before and after polishing by CMS, the reaction mechanisms were elucidated. Analytical results show that Y 3 Al 5 O 12 material produces YOOH and AlOOH in Na 2 SiO 3 solution, then combines with –Si–OH to form (Y-Si) and (Al-Si) with significantly reduced hardness compared to other Y 3 Al 5 O 12 materials, these products combine with MgO to form montmorillonites (3MgO–Al 2 O 3 –3SiO 2 –3Y 2 O 3 –5Al 2 O 3 ). With this formation, the surface layer of Y 3 Al 5 O 12 material becomes soft and is easily removed by ZrO 2 abrasive particles under the influence of mechanical polishing, resulting in superfine surfaces are generated from the proposed CMS model.

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