Optical and Electrical Characterizations of the V-shaped Pits in Fe-doped Bulk GaN

Yumin Zhang,Jianfeng Wang,Shunan Zheng,Demin Cai,Yu Xu,Mingyue Wang,Xiaojian Hu,Maomao Zhao,Ke Xu
DOI: https://doi.org/10.7567/1882-0786/ab2811
IF: 2.819
2019-01-01
Applied Physics Express
Abstract:The leakage current path in the vertical-type metal-semiconductor-metal structured device fabricated on a Fe-doped bulk GaN substrate with a V-shaped pit is investigated. Micro-Raman, micro-photoluminescence, and atomic force microscope show nonuniform distributions of the optical and electrical properties in the V-shaped pit. The distribution of carrier concentration is determined by the distributions of Si, O, and Fe impurities, which are further influenced by the incorporation efficiency of the corresponding impurities in the semi-polar growth facets. The mechanism of current leakage in a V-shaped pit is explained by the big difference between the resistance inside and outside the pit. (C) 2019 The Japan Society of Applied Physics
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