Improving the Current Spreading by Fe Doping in n-GaN Layer for GaN-Based Ultraviolet Light-Emitting Diodes

Huake Su,Shengrui Xu,Hongchang Tao,Xiaomeng Fan,Jinjuan Du,Ruoshi Peng,Ying Zhao,Lixia Ai,Haoyang Wu,Jincheng Zhang,Peixian Li,Yue Hao
DOI: https://doi.org/10.1109/led.2021.3100545
IF: 4.8157
2021-09-01
IEEE Electron Device Letters
Abstract:GaN-based light-emitting diodes (LEDs) grown on the insulating sapphire substrate suffer from a severe current crowding effect. To alleviate the current crowding effect, we demonstrate a current spreading structure for 365-nm ultraviolet LED using Fe doping in n-GaN layer. The surface morphology was studied by atomic force microscope, and the crystal quality was evaluated by high-resolution X-ray diffraction, which shows that a thin insertion layer doped with Fe has less influence on the crystalline quality. Additionally, inserting a Fe-doped layer with appropriate doping concentration enables to induce a barrier in the n-type layer, which contributes to the uniform current distribution. As a result, compared with conventional LED, the light output power obtains a 170.6% enhancement at 100 mA. Furthermore, the uniform optical emission distribution is also achieved by inserting a Fe-doped layer. Finally, the conduction band structures and horizontal hole concentration distributions are calculated by Advanced Physical Models of Semiconductor Devices, which illustrates the mechanism of current spreading.
engineering, electrical & electronic
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