Fabrication and Characteristics of High-Mobility Transparent Conducting IMO Thin Films Via Reactive Electron Beam Vapor Deposition

陈新亮,韩东港,张德坤,孙建,耿新华,赵颖
DOI: https://doi.org/10.16136/j.joel.2011.07.004
2011-01-01
Abstract:The influence of MoO3 doping concentration on the microstructure,optical and electrical properties of In2O3:MoO3(IMO) thin films deposited by the reactive electron beam vapor technique is investigated in detail.High purity In2O3:MoO3 ceramic targets and oxygen gas are used as source materials.With the increase of MoO3 doping concentration,the resistivity of IMO thin films decreases until 1.0 wt.% but then increases from 2.0 wt.% to 10 wt.%,and the optical transmittance shows a downward tendency.Typical performance parameters of IMO thin films at 1.0 wt.% MoO3 doping concentration are:resistivity of ρ~1.97×10-4 Ω·cm,sheet resistance of Rs~18 Ω,concentration of n~6.85×1020cm-3,electron mobility of μ~46.3 cm2·V-1·s-1,and transmittance in the visible and near infrared regions of T~75%-85%(including glass substrate).The high mobility IMO thin films are promising TCO materials applied in μc-Si:H thin film solar cells and a-Si:H/μc-Si:H tandem solar cells.
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