Abstract:Molybdenum doped indium oxide (In2−xMoxO3, IMO) is widely used in many electronic and optoelectronic devices due to its excellent electrical properties and optical transparency. In this work, a first attempt to produce IMO films by sol–gel dip coating was reported, starting from different reagents (i.e. indium nitrate or indium chloride and molybdenum chloride or ammonium molybdate as In and Mo sources, respectively). The influence of different reagents, solvents and annealing atmospheres (i.e. air and N2) on final coating properties was investigated in order to properly select the optimal process parameters. The morphological, microstructural and optical properties of the produced coatings were evaluated by scanning electron microscopy (SEM), X-ray diffractometry (XRD) and UV–vis spectroscopy. The best performances, in terms of microstructure and transparency, were obtained for films produced by dip coating the indium nitrate and molybdenum chloride based solutions (In nitrate concentration 0.1–0.2M), with the addition of a low amount of PEG, followed by annealing at 500°C. The produced coatings consisted of monophasic In2O3 and were characterised by a uniform, homogeneous and cracks free surface, and high transmittance values in the vis range (i.e. 85–98%).

Preparation of Molybdenum-Doped Indium Oxide Thin Films Using Reactive Direct-Current Magnetron Sputtering

The Electrical and Optical Properties of Molybdenum-Doped Indium Oxide Films Grown at Room Temperature from Metallic Target

Growth of High Mobility Transparent Conducting In2O3:Mo Thin Film

Transparent conductive In2O3:Mo thin films prepared by reactive direct current magnetron sputtering at room temperature

Properties of Transparent Conductive In2o3 : Mo Thin Films Deposited by Channel Spark Ablation

Growth of In2O3:Mo Thin Films by DC Reactive Magnetron Sputtering at Room Temperature

Molybdenum-doped Indium Oxide Transparent Conductive Thin Films

A new transparent conductive thin film In2O3:Mo

Mo-doped indium oxide films by dip-coating: Synthesis, microstructure and optical properties

Modulation of Optical and Electrical Properties of Sputtering-Derived Amorphous Ingazno Thin Films by Oxygen Partial Pressure

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Structural, Electrical, and Optical Properties of ZnInO Alloy Thin Films

Transparent conductive oxide thin films of tungsten-doped indium oxide

Origin of High Mobility in Molybdenum-Doped Indium Oxide

Novel transparent conductive films In2O3:Mo

Tungsten Doped Indium Oxide Thin Films Deposited at Room Temperature by Radio Frequency Magnetron Sputtering

Development of Novel Tungsten-Doped High Mobility Transparent Conductive In2O3 Thin Films

Fabrication and performance of indium oxide based transparent thin film transistors

Electrical and Optical Properties of Molybdenum-Doped Zno Transparent Conductive Thin Films Prepared by Dc Reactive Magnetron Sputtering

Properties of W-Mo Co-Doped In2O3 Thin Films Grown by Electron Beam Deposition

Tungsten-doped In2O3 Transparent Conductive Films with High Transmittance in Near-Infrared Region