Abstract:Al-doped ZnO (AZO) transparent conducting films were successfully prepared on glass substrates by RF magnetron sputtering method under different substrate temperatures. The microstructural, electrical and optical properties of AZO films were investigated in a wide temperature range from room temperature up to 350°C by X-ray Diffraction (XRD), Field-Emission Scanning Electron Microscopy (FESEM), High-Resolution Transmission Electron Microscopy (HRTEM), Hall measurement, and UV–visible meter. The nature of AZO films is polycrystalline thin films with hexagonal wurtzite structure and a preferred orientation along c-axis. The crystallinity and surface morphologies of the films are strongly dependent on the growth temperature, which in turn exerts a great effect on microstructural, electrical and optical properties of the AZO films. The atomic arrangement of AZO film having an wurtzite structure was indeed identified by the HRTEM as well as the Selected Area Electron Diffraction (SAED). The defect density of AZO film was investigated by HRTEM. The film deposited at 100°C exhibited the relatively well crystallinity and the lowest resistivity of 3.6×10−4Ωcm. The average transmission of AZO films in the visible range is all over 85%. More importantly, the low-resistance and high-transmittance AZO film was also prepared at a low temperature of 100°C.

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Effects of deposition power and pressure on the crystallinity of Al-doped ZnO thin films at glass substrates by low temperature RF magnetron sputtering

The properties of Al doped ZnO thin films deposited on various substrate materials by RF magnetron sputtering

Preparation and characterization of high-transmittance AZO films using RF magnetron sputtering at room temperature

High Performance AZO Thin Films Deposited by RF Magnetron Sputtering at Low Temperature

Effects of DC Sputtering Power on the Properties of AZO Films Deposited at Room Temperature for CIGS Photovoltaics

Microstructure, Opotoelectrical and Pre-Strain Dependent Electrical Properties of Azo Films on Flexible Glass Substrates for Flexible Electronics

Structural and Optoelectronic Properties of AZO Thin Films Prepared by RF Magnetron Sputtering at Room Temperature

Influence of Deposition Temperature on the Crystallinity of Al-doped ZnO Thin Films at Glass Substrates Prepared by RF Magnetron Sputtering Method

Deposition of quasi-crystal Al-doped ZnO thin films for photovoltaic device applications

Structural ,Electrical ,and Optical Properties of Transparent Conductive Al-Doped ZnO Films Prepared by RF Magnetron Sputtering

Effect of Al-doped on Optics and Electricity of ZnO (ZnO∶Al) Thin Films

Microstructure and Optical and Electrical Properties of Al-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering Method

Room-temperature Deposition of Transparent Conducting Al-doped ZnO Films by RF Magnetron Sputtering Method

Investigation on Azo Films Deposited by Radio-Frequency Reactive Magnetron Sputtering

Preparation and Properties of AZO Thin Films on Different Substrates

Characterization of AZO and Ag based films prepared by RF magnetron sputtering

Effects of Substrate Temperature and Sputtering Power on the Optical and Electrical Properties of Al-doped Zinc Oxide Thin Films by Reactive RF Magnetron Sputtering

Structural Evolution, Electrical and Optical Properties of AZO Films Deposited by Sputtering Ultra-High Density Target

Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering

Optical and Electrical Properties of Al Doped ZnO Thin Film with Preferred Orientation in Situ Grown at Room Temperature