Textured Surface Aluminum-Doped Zinc Oxide Thin Films Prepared by Direct Current Magnetron Sputtering

LI Lin-na,CHEN Xin-liang,LIU Chen,SUN Jian,GENG Xin-hua,ZHAO Ying
DOI: https://doi.org/10.16136/j.joel.2010.04.007
2010-01-01
Abstract:In general,flat surface zinc oxide thin films without textured structure were grown via magnetron sputtering methods.In this experience,textured surface aluminum doped zinc oxide(AZO) thin films were prepared by direct current(DC) magnetron reactive sputtering on common floating glass.High purity metallic Zn-Al (purity:99.999%,Al:2wt.%) target and oxygen (purity:99.999%) were used as source materials.At the higher substrate temperature of ~280 ℃,textured surface AZO thin film with pyramid-type morphology was obtained,without going through the process of wet-etching after sputtering.The microstructure and surface information,optical and electrical properties of AZO films with various substrate temperatures were investigated in detail.According to XRD and SEM test results,all samples we obtained were polycrystalline,hexagonal wurtzite structure with oriented in the (002) crystallographic direction.These AZO films showed different surface morphology with various substrate temperatures.The average transmissions of AZO thin films above 200 ℃ were more than 90% in the visible and near-infrared range and the resistivities of these films were less than 1.5×10-3 Ωcm.
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