TEXTURED TRANSPARENT CONDUCTIVE ZAO THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING

付恩刚,方玲,庄大明,张弓
DOI: https://doi.org/10.3321/j.issn:0254-0096.2003.05.019
2003-01-01
Abstract:Txtured transparent conductive ZAO (ZnO:Al) thin films was deposited on glass and Si wafers, using ZAO (98wt% ZnO+2wt% A12O3) ceramic target by intermediate frequency magnetron sputtering. The comparison of surface roughness, and electrical and optical properties, etc. between ZAO films prepared at various deposition parameters and SnO2:F films were studied. The structural characteristics of the films were investigated by the X-ray diffractometry (XRD) and atomic force microscope (AFM), while the visible transmittance and sheet resistance were studied by UV-VIS and four-point probe system, respectively. The results show textured ZAO thin films deposited at high operation gas pressure would be used as transparent electrode in amorphous silicon (a-Si) solar cells due to its comparable properties to textured SnO2:F film.
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