Abstract:Light trapping technique plays an important role in the high-performance thin film solar cells.In the present study,highly textured ZnO:Al(AZO) films are prepared by medium frequency impulsed magnetron sputtering and wet etching technology which are influenced by film thickness and etching time.The high-quality textured AZO surface is formed by wet etching after the films are deposited by magnetron sputtering technology.The effects of film thickness and etching-time on the textured structure and light-trapping characteristics are investigated.AZO films with different thicknesses are obtained by changing sputtering time,Precise etching time control leads to different textured structure with various light trapping properties.This textured surface morphology leads to a high haze factor which provides high light trapping efficiency.In addition,the electrical properties of AZO films are also enhanced with higher carrier concentration and mobility as thickness increases.Layers with outstanding electrical(resistivity less than 3×10-4 Ω·cm),optical(average total transmittance higher than 81% from 400 nm to 1 100 nm),haze(84.3% and 73.8% at 500 nm and 750 nm respectively) and morphological(RMS higher than 143 nm,after a 180 s etching process) properties have been obtained,satisfying the demands of photoelectric property of front contact in thin film silicon solar cells and illustrating a good potential application in mass production for large area expansibility.

The properties of surface textured ZnO:Al films grown in hydrogen atmosphere

Characterization of Surface Morphology and Light Scattering of Transparent Conducting ZnO:Al Films as Front Electrode for Silicon Thin Film Solar Cells

Highly Surface-Textured ZnO:Al Films Fabricated by Controlling the Nucleation and Growth Separately for Solar Cell Applications

Method for Fabricating Textured High-Haze ZnO:Al Transparent Conduction Oxide Films on Chemically Etched Glass Substrates

Textured transparent conductive B/Al doped ZnO films utilizing reactive magnetron sputtering

Development of Textured ZnO∶Al Transparent Conductive Oxide Thin Films

Effect of Al-doped on Optics and Electricity of ZnO (ZnO∶Al) Thin Films

Tailoring the Morphology, Optical and Electrical Properties of DC-sputtered ZnO:Al Films by Post Thermal and Plasma Treatments

Properties of Hydorogenated Al-Doped ZnO Films by Multi-Step Texture

Natively Textured Surface Al-doped ZnO-TCO Layers with Gradual Oxygen Growth for Thin Film Solar Cells Via Magnetron Sputtering

Light Scattering by Textured Al-Doped Zinc Oxide Film for Thin Film Silicon Solar Cells Coated on Glass Substrates

Self-Flattened ZnO:Al Transparent Conductive Thin Films Derived by Sol–Gel Process

Study of ZnO:Al Films for Silicon Thin Film Solar Cells

Surface morphology and light trapping properties of textured ZnO films

Preparation and Characteristics of Natively Textured Surface ZnO:Al-TCO Thin Films Grown Via Magnetron Sputtering

Highly conductive and transparent Al-doped ZnO films on glass substrate via incorporating hydrogen at low substrate temperatures

Optical and structural properties of Al-doped ZnO thin films by sol gel process

High-Haze and Wide-Spectrum Hydrogenated Mgzo Tco Films on Micro-Textured Glass Substrates for Thin-Film Solar Cells

Structural, electrical, and optical properties of transparent conductive oxide ZnO:Al films prepared by dc magnetron reactive sputtering

Tailoring of Textured ZnO: Al Film Via Hydrogen

Modified Textured Surface Mocvd-Zno:B Transparent Conductive Layers for Thin-Film Solar Cells