Effects of the Interface-related and Bulk-fixed Charges in Ge/GeO2 Stack on Band Bending of Ge Studied by X-ray Photoemission Spectroscopy

W.F. Zhang,C.H. Lee,C.M. Lu,T. Nishimura,K. Nagashio,K. Kita,A. Toriumi
DOI: https://doi.org/10.7567/ssdm.2013.ps-1-9
2013-01-01
Abstract:2013 International Conference on Solid State Devices and Materials,Effects of the Interface-related and Bulk-fixed Charges in Ge/GeO2 Stack on Band Bending of Ge Studied by X-ray Photoemission Spectroscopy
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