Band Alignment Between Gete and Sio2/Metals for Characterization of Junctions in Nonvolatile Resistance Change Elements

E. K. Chua,L. P. Shi,M. H. Li,R. Zhao,T. C. Chong,T. E. Schlesinger,J. A. Bain
DOI: https://doi.org/10.1063/1.3599057
IF: 4
2011-01-01
Applied Physics Letters
Abstract:GeTe materials were characterized using x-ray photoelectron spectroscopy in both the amorphous and crystalline states. Valence and conduction band alignments relative to a SiO2 reference were measured to allow the GeTe band diagram, work function, and electron affinity to be inferred. Hole barrier heights was also studied for several metal/GeTe systems (metal=Al,Ni,W) to extract the charge neutrality level of these interfaces for GeTe in both the crystalline and amorphous states. Near perfect Fermi-level pinning was observed for crystalline GeTe in contact with all of the metals with much less pinning observed for amorphous GeTe.
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