Abstract:Films composed of nanoparticles have been commonly used in decorative applications due to their striking colors and useful self-cleaning properties. An efficient option for the structural coloration has been developed through fabrication of the thin films on substrates from SiO2 nanoparticles and PEI. The surface morphology and microstructure of SiO2/polyethyleneimine (PEI) film on glass substrate were analyzed with an SEM, AFM, and thickness analyzer. The homogeneous coatings of limited SiO2 aggregation with air voids were formed on glass substrates. It was strongly suggested that optical properties of the films came from the single-layer thin film interference effect. The structural colors of SiO2/PEI films were captured by digital camera, integrating sphere spectrophotometer and multi-angle spectrophotometer. The results indicated that the films illuminated distinctly as the thickness increased, and presented different lightness values and hues at various viewing angles. Moreover, those films with some surface roughness exhibited high water static contact angle, which endowed the films potential hydrophilicity and self-cleaning property.

SEM Research of SiO2 Thin Film on Inner Wall of Glass Container by PECVD

A Study of PECVD Amorphous SiO2 Films Using Infrared Absorption Techniques

Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering

Monomers effect on the gas and humid barrier properties in PECVD deposited SiOx film on PET surface

Preparation and Photoluminescence of Nanocrystalline Si-Rich Silicon Oxide Films by Pecvd

In-situ diagnosis during preparation of SiO_x thin films by mass spectroscopy and their characteristics

The Power Source Effect on SiOx Coating Deposition by Plasma Enhanced Chemical Vapor Deposition

Effects of Substrate Temperature on the Properties of Silicon Oxide Films by PECVD

The Study of Microcrystalline Silicon Thin Films Prepared by PECVD

Non-equilibrium,Atmospheric-pressure Plasma Jet for Depositing Silicon Oxide Films

Simulation and Experimental Verification of Silicon Dioxide Deposition by PECVD

Coating of glass with low reflection Si nanofilm

Application of PECVD SiC in glass micromachining

Variable Structural Colors and Hydrophobicity of SiO 2 /polyethyleneimine Coating on Glass Substrate

Investigation of PECVD SiC nano film

THE OES IN DEPOSITING MICROCRYSTALLINE SILICON MATERIAL BY RF-PECVD

Structural Investigation And Barrier Properties Of A-C : H Thin Films On Polymer By Pecvd

The Fabrication and Characterization of Silicon-based Ultra Thin Dielectric Films

PECVD Deposition and Characterization of Thick Silica Film for Optical Waveguide

Deposition of high reflectance Si-based multi-layered coatings on curved glass substrates

Growth of SiO2 films by ECR-PECVD for planar optical waveguide and its properties