Abstract:Silicon carbide (SiC) is a rapidly emerging material for photonic applications, thanks to its exceptional optical properties. To be used as a waveguide, SiC thin films must be deposited directly on silica at low temperature. Amorphous SiC films were deposited by RF magnetron sputtering using a single source of high-purity polycrystalline SiC. A systematic study of the chemical, structural and optical properties of the films was carried out, using a combination of XRD, XPS, SIMS, spectroscopic ellipsometry, Raman spectroscopy and UV-Vis absorption spectroscopy. The aim was to link deposition conditions to film properties. By exploring a three-parameter space (RF power, substrate temperature, pressure), we have demonstrated that RF power is the main parameter which controls the entire deposition process and film properties. By simply adjusting the RF plasma power between 150 and 450 W, it is possible to adjust the refractive index at a wavelength of 1.5 mu m in the range 2.50-2.75 and vary the bandgap from 2.5 to 1.7 eV. This is attributed to a slight variation in film composition, particularly in terms of Si/C ratio and C-C bond concentration.

PECVD Deposition and Characterization of Thick Silica Film for Optical Waveguide

A Study of PECVD Amorphous SiO2 Films Using Infrared Absorption Techniques

SEM Research of SiO2 Thin Film on Inner Wall of Glass Container by PECVD

Planar optical waveguide thin films grown by microwave ECR PECVD

Growth of SiO2 films by ECR-PECVD for planar optical waveguide and its properties

Optical Properties Study of Silicon Oxynitride Films Deposited by RF Magnetron Sputtering

Pulsed Laser Deposition of Films on Fused Silica in Waveguide Form

Cubic Phase MgxZn1−xO Thin Films for Optical Waveguides

Different Index Contrast Silica-on-silicon Waveguides by PECVD

Study of SiO2 Thin Film Deposition by PECVD

Preparation and Photoluminescence of Nanocrystalline Si-Rich Silicon Oxide Films by Pecvd

Fabrication of Si/Si1-Xgex Waveguide Wdm Components

Tuning the peak position of subwavelength silica nanosphere broadband antireflection coatings.

Technology control and properties of PECVD SiON films and its potential applications

Characteristics of SiC_x: H and SiN_x Cy:H Thin Films Deposited by PECVD

Investigation of Amorphous-Sic Thin Film Deposition by RF Magnetron Sputtering for Optical Applications

Preparation of C-Axis Oriented ZnO Optical Waveguiding Films on Fused Silica by Pulsed Laser Reactive Ablation

Laser Annealing of SiO2 Film Deposited by ICPECVD for Fabrication of Silicon Based Low Loss Waveguide

Study of SiO2 Films Prepared by Electron Cyclotron Resonant Microwave Plasma

Pulsed Laser Deposition of C-Oriented Optical Waveguiding Bilayered Films on Silicon Wafers

Effects of Substrate Temperature on the Properties of Silicon Oxide Films by PECVD