Abstract:Using Zn targets in a 100 Pa oxygen ambient at substrate temperatures of 275–425°C, completely (0001)-textured ZnO thin films have been deposited on (0001)-oriented α-SiO2 substrates by the pulsed laser reactive ablation technique. The effects of deposition parameters on the microstructures of the films have been analysed. The full-width-at-half-maximum (FWHM) 2θ angle of the (0002) X-ray reflection reached its minimum of 0.320° for the ZnO films grown at substrate temperatures between 325 and 375°C. The films proved to be dense, smooth, transparent and colourless. Thick lamina-like grains were observed in the ZnO films by scanning electron microscopy. The reflective indices of the films vs. wavelength calculated from the measured oscillated optical transmittance were close to those of bulk ZnO crystal. The band gap of the piezoelectric semiconductor ZnO was estimated as 3.28 eV. Favourable optical waveguiding properties of the films have been demonstrated by the observation of sharp m-lines from the transverse electric (TE) modes excited by the prism-coupling method.

Pulsed Laser Deposition of Films on Fused Silica in Waveguide Form

PECVD Deposition and Characterization of Thick Silica Film for Optical Waveguide

Preparation of C-Axis Oriented ZnO Optical Waveguiding Films on Fused Silica by Pulsed Laser Reactive Ablation

Optical Waveguiding (Pb, La)(Zr,Ti)O<sub>3</sub> Thin Films Prepared by Pulsed Laser Deposition

Optical Waveguiding (Pb, La)(Zr,Ti)O3 Thin Films Prepared by Pulsed Laser Deposition

Pulsed-Laser Deposition and Characterization of Optical Wave-Guiding (Pb,la)(zr,ti)o-3 Thin-Films

Pulsed Laser Deposition of C-Oriented Optical Waveguiding Bilayered Films on Silicon Wafers

(012) Textured LiNbO3 Waveguiding Films Grown on SiO2 by Pulsed Laser Deposition Technique

Pulsed-Laser Deposition and Optical Properties of Completely (001) Textured Optical Waveguiding Linbo3 Films Upon Sio2/Si Substrates

Excimer Laser Ablation of (001) Textured Zno Waveguiding Films on Fused Silica

Epitaxial Growth of Optical LiTaO 3 and LiNbO 3 Waveguide Film by Pulsed-Laser Deposition

Cubic Phase MgxZn1−xO Thin Films for Optical Waveguides

Planar optical waveguide thin films grown by microwave ECR PECVD

Pulsed laser deposition of c-orientedLiNbO3LiTaO3 optical waveguiding bilayered films on silicon wafers

Pulsed Laser Deposition of Optical Waveguiding LiNbO 3 Films on SiO 2 Substrate

Pulsed Laser Deposition Optical Waveguiding Bi3TiNbO9 Thin Films on Fused Silica

Growth of SiO2 films by ECR-PECVD for planar optical waveguide and its properties

Pulsed Laser Reactive Ablation of (0001)-Textured ZnO Optical Waveguiding Films on Α-Sio2

Polycrystalline ZnTe Thin Film on Silicon Synthesized by Pulsed Laser Deposition and Subsequent Pulsed Laser Melting

BaTiO3 Film Optical-Waveguide Prepared by Pulsed Laser Deposition

High-power Optical Continuous-Wave Waveguiding in a Silica Micro/nanofiber