Abstract:Complexes of poly(diallyldimethylammonium chloride) (PDDA) and sodium silicate (PDDA-silicate) are alternately deposited with poly(acrylic acid) (PAA) to fabricate PAA/PDDA-silicate multilayer films. The removal of the organic components in the PAA/PDDA-silicate mulilayer films through calcination produces highly porous silica coatings with excellent mechanical stability and good adhesion to substrates. Quartz substrates covered with such porous silica coatings exhibit both antireflection and antifogging properties because of the reduced refractive index and superhydrophilicity of the resultant films. A maximum transmittance of 99.86% in the visible spectral range is achieved for the calcinated PAA/PDDA-silicate films deposited on quartz substrates. The wavelengths of maximum transmittance could be well tailored by simply changing the deposition cycles of multilayer films. The usage of PDDA-silicate complexes allows for the introduction of high porosity to the resultant silica coatings, which favors the fabrication of antireflection and antifogging coatings with enhanced performance. Meanwhile, PDDA-silicate complexes enable rapid fabrication of thick porous silica coatings after calcination because of the large dimensions of the complexes in solution. The easy availability of the materials and simplicity of this method for film fabrication might make the mechanically stable multifunctional antireflection and antifogging coatings potentially useful in a variety of applications.

Deposition of high reflectance Si-based multi-layered coatings on curved glass substrates

A novel trilayer antireflection coating using dip-coating technique

SEM Research of SiO2 Thin Film on Inner Wall of Glass Container by PECVD

Preparation of Anti-Reflective and Protective Diamond-Like Carbon Film on Si Substrate by Femto-Second Pulsed Laser Deposition

Broadband Absorption Coating for Large-Curvature Surfaces by Atomic Layer Deposition

Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering

Precise broad-band anti-refection coating fabricated by atomic layer deposition

Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

Design and fabrication of multilayer antireflection coating for optoelectronic devices by plasma enhanced chemical vapor deposition

Cu‐induced Poly‐si/sio2/α‐si Multilayer Film with High Reflectivity Across the Whole Visible Band

Coating of glass with low reflection Si nanofilm

The Power Source Effect on SiOx Coating Deposition by Plasma Enhanced Chemical Vapor Deposition

Tuning the peak position of subwavelength silica nanosphere broadband antireflection coatings.

Double-sided Optical Coating of Strongly Curved Glass by Atomic Layer Deposition.

Mechanically Stable Antireflection And Antifogging Coatings Fabricated By The Layer-By-Layer Deposition Process And Postcalcination

Simulation and Experimental Verification of Silicon Dioxide Deposition by PECVD

Deposition of TiO2 by Medium Frequency Reactive Dual Magnetron Sputtering

Variable Structural Colors and Hydrophobicity of SiO 2 /polyethyleneimine Coating on Glass Substrate

A Study of the Influence of Process Parameters of AP PECVD on the Mechanical Properties of Silica-like Films Deposited on Polycarbonate

Facet Antireflection Coatings Deposited by PECVD

Superhydrophilic and Antireflective Properties of Silica Nanoparticle Coatings Fabricated Via Layer-by-Layer Assembly and Postcalcination