Precise broad-band anti-refection coating fabricated by atomic layer deposition

Yanghui Li,Weidong Shen,Yueguang Zhang,Xiang Hao,Huanhuan Fan,Xü Liu
DOI: https://doi.org/10.1016/j.optcom.2012.11.071
IF: 2.4
2013-01-01
Optics Communications
Abstract:By demarcating the ranges of transition regions on different underlayers in atomic layer deposition (ALD), their effects on broad-band anti-refection (BBAR) coating (400–680nm) are evaluated. In ALD, comparatively larger transition region of TiO2 on bare BK7 glass severely limits the fabricated precision of BBAR coating with a thin first layer. Considering that the transition region on existent ALD material is much thinner than that on bare substrate, a thick Al2O3 film is inserted as a pre-deposited layer on the substrate to completely overlay the transition region on bare BK7.A good agreement between the designed and experimental curves is obtained, and its average reflectance is 0.535% (400–680nm) in practice.
What problem does this paper attempt to address?