Atomic Layer Deposition of Al2O3 and TiO2 Multilayers for Application As Broadband Antireflection Coating

Yanghui Li,weidong shen,Yueguang Zhang,Xu Liu
DOI: https://doi.org/10.1364/oic.2013.wc.5
2013-01-01
Abstract:A thick Al2O3 film is inserted as a pre-deposited layer to overlay the transition region on bare BK7 in atomic layer deposition. The average reflectance is 0.535% (400~680nm) in practice, compared with the designed 0.408%.
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