Low-Temperature Cu-Cu Bonding Process Based on the Sn-Cu Multilayer and Self-Propagating Reaction Joining

Jinhu Fan,Tielin Shi,Zirong Tang,Bo Gong,Junjie Li,Jie Huang,Tianxiang Li
DOI: https://doi.org/10.1007/s11664-018-6827-z
IF: 2.1
2018-01-01
Journal of Electronic Materials
Abstract:Transient liquid phase bonding can be realized at a relatively low temperature through building an intermetallic interconnection. A self-propagating reaction joint can achieve a low temperature bond by confining the heat at the bonding interface and reduce the thermal effect on other components. In this work, a Sn-Cu alternating multilayer was combined with an Al-Ni self-propagating reaction joint to develop a highly efficient low-temperature Cu-Cu hybrid bonding process. The Sn-Cu alternating multilayer was directly prepared on the Cu substrates by an alternating electroplating process. The Al-Ni multilayer film was sandwiched between two Cu substrates under a pressure of 5 MPa and ignited with a 15-V spark at room temperature. Cu-Cu bonds with three different Sn/Cu thickness ratios were studied. It was found that the Cu 6 Sn 5 layer within the three Sn layers had different thicknesses and decreased with increasing distance from the heat source of the Al-Ni nanofoil. The thickness difference between adjacent Cu 6 Sn 5 layers at first decreased with the increasing Sn/Cu thickness ratio in these three groups and then remained constant. The shear strength of the bonds varied with the thickness of Cu 6 Sn 5 layer and achieved a high shear strength with a Sn/Cu thickness ratio of 1.6 μ m/1 μ m, where fracture occurred within the Cu 6 Sn 5 layer near the Cu substrate. The combination of the Sn-Cu multilayer and self-propagating reaction joining process can achieve a good low-temperature bond between Cu substrates with an optimized Sn/Cu thickness ratio, which has a strong influence on the quality of bonds, the Cu 6 Sn 5 morphology, and shear strength.
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