Abstract:Aluminum-doped zinc oxide (AZO) is a popular, low-cost, nontoxic material that finds application as a transparent conducting electrode in photonic, sensing, and photovoltaic devices. We report the AZO thin films with a high figure of merit on large-area glass substrates by direct current magnetron sputtering without any intentional substrate heating. Furthermore, a simple thermal post-treatment to improve the transmittance of AZO thin film in the infrared region for its application in low-band-gap devices is presented. High optoelectronic properties are obtained by optimizing oxygen content during the sputtering process. The structural, morphological, optoelectrical, and photoluminescence characterization of cold sputtered AZO films is investigated for its latent applications. AZO thin films with an electrical sheet resistance of 8.8 Ω/□ and a visible light transmittance of 78.5% with thickness uniformity above 95% are achieved on 300 mm × 300 mm glass substrate. The AZO film with optimized process conditions is employed as a transparent electrode to fabricate a copper-indium-gallium-selenide-based thin film solar cell, demonstrating 11.8% power conversion efficiency. The AZO film with optimized sputter conditions was post-treated in ambient conditions with an Al blanket to suppress the resistivity by proper organization of the defects due to Al consumption and point defects, resulting in improved transparency (85%) in the infrared region with a sheet resistance of 40 Ω/□. This has great potential for developing scalable and low-cost AZO thin films for transparent electrodes in a wide range of the spectrum.

Highly Conductive and Transparent AZO Films Fabricated by PLD As Source/Drain Electrodes for TFTs

High Conductivity and Transparent Aluminum-Based Multi-Layer Source/drain Electrodes for Thin Film Transistors

48.2: Invited Paper: High Conductivity & Transparent Aluminum‐based Multi‐layer Source/drain Electrodes for Thin Film Transistors

Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process

Enhanced Performance in Al-Doped ZnO Based Transparent Flexible Transparent Thin-Film Transistors Due to Oxygen Vacancy in ZnO Film with Zn-Al-O Interfaces Fabricated by Atomic Layer Deposition.

Effect of Film Thickness on Properties of Al-Doped Zno Film As Transparent Conducting Electrodes in Oleds

Highly Transparent and Conductive W-Doped ZnO/Cu/W-Doped ZnO Multilayer Source/Drain Electrodes for Metal-Oxide Thin-Film Transistors

Aluminum-Doped Zinc Oxide Transparent Electrode Prepared by Atomic Layer Deposition for Organic Light Emitting Devices

Feasibility of ZnO:Al/Ag/ZnO:Al multilayer source/drain electrode to achieve fully transparent HfInZnO thin film transistor

Fully transparent al-doped ZnO thin-film transistors on flexible plastic substrates

Fabrication Of Transparent Conductive Azo (Zno:Al) Film By Plasma Enhanced Chemical Vapor Deposition

A High-quality AZO/Au/AZO Sandwich Film with Ultra-low Optical Loss and Resistivity for Transparent Flexible Electrodes.

High-Performance Flexible Tin-Zinc-Oxide Thin-Film Transistors Fabricated on Plastic Substrates

High-performance low-temperature transparent conducting aluminum-doped ZnO thin films and applications

High-performance transparent AZO TFTs fabricated on glass substrate

Highly Transparent Red Organic Light-Emitting Diodes with AZO/Ag/AZO Multilayer Electrode

Chitosan-Gated Low-Voltage Transparent Indium-Free Aluminum-Doped Zinc Oxide Thin-Film Transistors

Room Temperature Sputtered Aluminum-Doped ZnO Thin Film Transparent Electrode for Application in Solar Cells and for Low-Band-Gap Optoelectronic Devices

A Comprehensive Investigation of the Mechanical and Tribological Properties of AZO Transparent Conducting Oxide Thin Films Deposited by Medium Frequency Magnetron Sputtering

An Anode with Aluminum Doped on Zinc Oxide Thin Films for Organic Light Emitting Devices

Al-Doped Zno Thin-Film Transistors on Flexible Plastic Substrate