Abstract:Aluminum-doped ZnO (AZO) has huge prospects in the field of conductive electrodes, due to its low price, high transparency, and pro-environment. However, enhancing the conductivity of AZO and realizing ohmic contact between the semiconductor and AZO source/drain (S/D) electrodes without thermal annealing remains a challenge. Here, an approach called pulsed laser deposition (PLD) is reported to improve the comprehensive quality of AZO films due to the high energy of the laser and non-existence of the ion damage. The 80-nm-thick AZO S/D electrodes show remarkable optical properties (transparency: 90.43%, optical band gap: 3.42 eV), good electrical properties (resistivity: 16 × 10−4 Ω·cm, hall mobility: 3.47 cm2/V·s, carrier concentration: 9.77 × 1020 cm−3), and superior surface roughness (Rq = 1.15 nm with scanning area of 5 × 5 μm2). More significantly, their corresponding thin film transistor (TFT) with low contact resistance (RSD = 0.3 MΩ) exhibits excellent performance with a saturation mobility (µsat) of 8.59 cm2/V·s, an Ion/Ioff ratio of 4.13 × 106, a subthreshold swing (SS) of 0.435 V/decade, as well as good stability under PBS/NBS. Furthermore, the average transparency of the unpatterned multi-films composing this transparent TFT can reach 78.5%. The fabrication of this TFT can be suitably transferred to transparent arrays or flexible substrates, which is in line with the trend of display development.

Enhanced Performance in Al-Doped ZnO Based Transparent Flexible Transparent Thin-Film Transistors Due to Oxygen Vacancy in ZnO Film with Zn-Al-O Interfaces Fabricated by Atomic Layer Deposition.

Effect of Film Thickness on Properties of Al-Doped Zno Film As Transparent Conducting Electrodes in Oleds

Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process

Fully transparent al-doped ZnO thin-film transistors on flexible plastic substrates

High-performance low-temperature transparent conducting aluminum-doped ZnO thin films and applications

Aluminum-Doped Zinc Oxide Transparent Electrode Prepared by Atomic Layer Deposition for Organic Light Emitting Devices

Highly Conductive and Transparent AZO Films Fabricated by PLD As Source/Drain Electrodes for TFTs

Enhanced Stability Performance of Transparent Ozone ALD ZnO Thin-Film Transistors with SiAlOX Dielectric

Al-Doped Zno Thin-Film Transistors on Flexible Plastic Substrate

AZO (zno:Al) Transparent Conductive Film Prepared by Plasma Enhanced Chemical Vapour Deposition and Its Performances in Comparison with ZnO Film

Transparent Conductive Al-Doped Zno Thin Films Grown at Room Temperature

Atomic Layer-Deposited Al-Doped ZnO Thin Films for Display Applications

Structural ,Electrical ,and Optical Properties of Transparent Conductive Al-Doped ZnO Films Prepared by RF Magnetron Sputtering

Effect of Al Doping on Performance of ZnO Thin Film Transistors

48.2: Invited Paper: High Conductivity & Transparent Aluminum‐based Multi‐layer Source/drain Electrodes for Thin Film Transistors

Improved Performance of Transparent-Conducting AZO/Cu/AZO Multilayer Thin Films by Inserting a Metal Ti Layer for Flexible Electronics.

Flexible Nickel-Doped Zinc Oxide Thin-Film Transistors Fabricated On Plastic Substrates At Low Temperature

Feasibility of ZnO:Al/Ag/ZnO:Al multilayer source/drain electrode to achieve fully transparent HfInZnO thin film transistor

Tailoring of Optical and Electrical Properties of Transparent and Conductive Al-doped ZnO Films by Adjustment of Al Concentration

Fabrication Of Transparent Conductive Azo (Zno:Al) Film By Plasma Enhanced Chemical Vapor Deposition

A Comparative Study of Growth and Properties of Atomic Layer Deposited Transparent Conductive Oxide of Al Doped ZnO Films from Different Al Precursors