Abstract:This study presents the creation of a gradient refractive index film on the surface of aluminosilicate glass using a two-step process involving chemical etching and subsequent multilayer sol-gel coating with hollow silica nanospheres. The primary objective was to achieve effective anti-reflection properties. Various analytical techniques such as FESEM, TEM, UV-Vis-NIR spectrophotometry, ellipsometer, and FT-IR spectrometry were employed to investigate the impact of glass surface morphology and refractive index on optical characteristics. The results revealed the successful formation of a porous structure on the glass surface through chemical etching. Subsequently, this porous structure was uniformly filled and layered with hollow silica spheres of different sizes, resulting in a stepwise gradient refractive index coating. Notably, the pore size of the hollow spherical silica colloidal particles progressively increased from 0 nm to 23 nm, corresponding to distinct film thicknesses and refractive indices. This stepwise modulation contributed to the establishment of a gradient refractive index within the coating. By transitioning the refractive index of the film layer from that of glass to air, the film acted as a matching layer, thereby achieving broadband anti-reflection. The efficiency of this anti-reflection was demonstrated by an increase in transmittance from an initial value of 91.8-95.32% following the two-step etching process. With the subsequent SiO2 coating, the transmittance continued to improve, ultimately reaching a high value of 97.47%. This improvement in transmittance was attributed to the gradual enhancement of the film layer.

Study of Gradient Thin Film Material Produced by PECVD

Optical Properties Study of Silicon Oxynitride Films Deposited by RF Magnetron Sputtering

PROPERTIES OF PECVD SiNx FILM FOR SOLAR CELLS

Research on Nitride Membranes Grown by PECVD

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Study of SiO2 Thin Film Deposition by PECVD

Depth Profile of Oxygen in SiO_xN_y Functional Gradient Thin Film Using 4 He O Resonance Scattering

Influence of PECVD process on the etching rate of SiNx films

Preparation and Photoluminescence of Nanocrystalline Si-Rich Silicon Oxide Films by Pecvd

Technology control and properties of PECVD SiON films and its potential applications

Processing and Characterisation of PECVD Silicon Nitride Films

Influence of PECVD Process Parameters on the Etching Rate of SiN X Films

A Novel Strategy for Designing Fe-Ni Gradient Multilayer Coatings Using Laser-Assisted Electrodeposition and Regulation Mechanism

Characteristics of SiC_x: H and SiN_x Cy:H Thin Films Deposited by PECVD

Optimization of PECVD silicon oxynitride films for anti-reflection coating

PECVD Deposition and Characterization of Thick Silica Film for Optical Waveguide

Study of SiNx Thin Film Character with Gas Flow Rate in PECVD

Preparation of Gradient Refractive Index Films on Glass Surface and Its Anti-Reflection Properties

The Variation of Physical Properties of Plasma‐Deposited Silicon Nitride and Oxynitride with Their Compositions

The Study of Microcrystalline Silicon Thin Films Prepared by PECVD

Mode Shift of a Thin-Film F-P Cavity Grown with ICPCVD