An In-line Test Method for the TSV Insulation Integrity

MIAO Min,XU Yichao,WANG Guanjiang,SUN Xin,FANG Runiu,JIN Yufeng
DOI: https://doi.org/10.3969/j.issn.1671-7449.2012.06.001
2012-01-01
Abstract:Through silicon via(TSV) is the most vital technology of the advanced 3D system-in-package integration and 3D IC integration.The insulation integrity of TSVs is among the key factors that determine TSV electrical properties and long term reliability.Total production cost can be reduced by performing in-line test during manufacturing and then screening out defective wafers at early stage.An in-line method is proposed to verify the TSV insulation quality after the blind vias are formed and before next process(i.e.wafer thinning) is carried out.During the test,the leakage current data between two blind vias is obtained and plotted through I-V characteristic test by probing the pads upon these blind TSVs.TSVs can be determined as a qualified one with insulation integrity when I-V curve varies linearly between 7 V~10 V and the leakage current is on the orders of dozens of pA.If an abrupt rise of leakage current or even breakthrough appears at voltages equal to or under 7 V,then it can be deduced that the insulation integrity of one or both of the blind vias under test has been compromised.Finite element method(FEM) simulation was used to illustrate the testing principle,and experimental test were carried out for validation.
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