Enhanced Critical Electrical Characteristics in a Nanoscale Low-Voltage SOI MOSFET With Dual Tunnel Diode

M. K. Anvarifard,A. Orouji
DOI: https://doi.org/10.1109/TED.2015.2414825
IF: 3.1
2015-03-31
IEEE Transactions on Electron Devices
Abstract:This brief presents a nanoscale low-voltage partially depleted silicon-on-insulator (SOI) structure with improved electrical performance. The brain of the proposed structure is a dual tunnel diode (DTD) composed of a heavily doped p-type L-shaped trench. The accumulated holes are effectively released by the tunnel current of DTD, thus reducing the critical kink effect. Compared with a conventional SOI, the proposed structure is considered as an efficient rival in nanoscale-integrated applications.
Engineering,Materials Science,Physics
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