Preparation and the electrical properties of In–Zn–Li–O thin film transistor by radio frequency magnetron sputtering

bin li,hailong wang,dongzhan zhou,zuofu hu,huaihao wu,song gao,yunfei peng,lixin yi,xiqing zhang,yongsheng wang
DOI: https://doi.org/10.1016/j.matlet.2014.07.181
IF: 3
2014-01-01
Materials Letters
Abstract:Indium–zinc–lithium–oxygen (IZLO) thin film was produced by radio frequency magnetron sputtering, and the electronic properties of the TFT were investigated. The X-ray diffraction spectroscopy showed that IZLO film contains different ZnkIn2Ok+3 phases. Using this film as the channel layer, we fabricated a bottom gate thin film transistor (TFT), which exhibited n-channel enhancement mode behavior, and showed good performance with a field effect mobility of 80.4cm2/Vs, an on/off ratio of 4.0×106, and a threshold voltage of 4.1V. We also investigated the environmental stability of the IZLO TFT after exposure to air, and the device exhibited a relatively stable electrical performance.
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