Gete4 As A Candidate for Phase Change Memory Application

Li Run,Tang Shi-Yu,Bai Gang,Yin Qiao-Nan,Lan Xue-Xin,Xia Yi-Dong,Yin Jiang,Liu Zhi-Guo
DOI: https://doi.org/10.1088/0256-307x/30/5/058101
2013-01-01
Chinese Physics Letters
Abstract:GeTe4 films are deposited by using a dc magnetron sputtering technique, and its structural, thermal and electrical properties are investigated systematically. The prototypical phase-change memory cells are fabricated by using a focused ion beam and magnetron sputtering techniques. Compared with Ge2Sb2Te5, the GeTe4 film exhibits a higher crystallization temperature (235°C), better data retention of ten years at 129°C, and larger activation energy (2.94 eV). GeTe4 phase change memory cells with an effective diameter of 1 μm show proper switching speed, low power consumption, and good resistance contrast. The Set and Reset operations are achieved by using a 200-ns 2.0-V pulse and a 30-ns 3.0-V pulse, respectively. The dynamic switching ratio between the OFF and ON states is larger than 1 × 104.
What problem does this paper attempt to address?