Abstract:Frank-type stacking faults in 4H–SiC epitaxial layers were investigated using room-temperature photoluminescence mapping and high-angle annular dark-field high-resolution scanning transmission electron microscopy. Remarkably, the intrinsic Frank-type stacking fault (5,2) and intrinsic multilayer Frank-type stacking fault (4,2), which have been reported to have elongated triangular shapes to date, were found to have broader triangular shape, which was typical shape of Shockley-type stacking faults. The shaping of stacking faults could be explained based on the directions of the partial dislocations bounding the stacking faults. Formation models for the intrinsic (5,2) and (4,2) stacking faults were proposed. In addition, we observed Frank-type stacking faults (3,2,2,3) and (3,3) and Shockley-type stacking faults (3,3,3,2,3,2) and (3,2,3,3,3,2), which were not reported before. All of these stacking faults were composed with the stacking numbers 2 and 3 in the Zhdanov notation and showed very close characteristic photoluminescence emission wavelengths of 427–428 nm. Formation models for the stacking faults of (3,2,2,3), (3,3), (3,3,3,2,3,2), and (3,2,3,3,3,2) were proposed, also. Based on the proposed formation models of (4,2) and (3,3) stacking faults, formation models for the Frank-type stacking faults (4,1) and (3,2) were discussed. Finally, we pointed out that the (4,1) Frank-type stacking fault should be the intrinsic not the extrinsic fault, and the (3,2) Frank-type stacking fault is the extrinsic fault.

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